Automated wafer-scale fabrication of electron beam deposited tips for atomic force microscopes using pattern recognition

Nanotechnology

Volumn 15, Issue 9, 2004, Pages 1131-1134

  Kindt, Johannes H ^a   Fantner, Georg E ^a   Thompson, James B ^b   Hansma, Paul K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Standard and Poor's   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; EDGE DETECTION; ELASTIC MODULI; ELECTRON BEAMS; ETCHING; FABRICATION; HYDROPHOBICITY; MICROMACHINING; PATTERN RECOGNITION; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY; WEAR RESISTANCE;

CANTILEVER DEFLECTION; ELECTRON BEAM DEPOSITION; STEPPER INDEXERS; THERMAL MASS;

WSI CIRCUITS;

EID: 4544229387     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/9/005     Document Type: Article

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