Position- and size-controlled fabrication of iron silicide nanorods by electron-beam-induced deposition using an ultrahigh-vacuum transmission electron microscope

Applied Physics Letters

Volumn 86, Issue 18, 2005, Pages 1-3

  Tanaka, M ^a   Chu, F ^a   Shimojo, M ^a,b   Takeguchi, M ^a   Mitsuishi, K ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; ELECTRODEPOSITION; ELECTRON ABSORPTION; ETCHING; NANOTECHNOLOGY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM;

ELECTRON-BEAM-INDUCED DEPOSITION; IRON SILICIDE NANORODS; IRON SURFACE; PRECURSOR GASES;

CARBON NANOTUBES;

EID: 20844435774     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1922576     Document Type: Article

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