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Small

Volumn 1, Issue 10, 2005, Pages 924-939

Recent developments in nanofabrication using focused ion beams

(1) Tseng, Ampere A a,b

a Arizona State University (United States)

b ARIZONA STATE UNIVERSITY (United States)

Author keywords

Direct writing; Focused ion beams; Nanofabrication; Nanostructures; Patterning

Indexed keywords

DIRECT WRITING; FOCUSED ION BEAM (FIB) TECHNOLOGY; ION-INDUCED DEPOSITION; PATTERNING;

DEPOSITION; ETCHING; ION BEAMS; ION IMPLANTATION; MILLING (MACHINING);

NANOTECHNOLOGY;

CARBON; INORGANIC COMPOUND; ION; NANOMATERIAL; NANOPARTICLE; SILICON; SILICON CARBIDE; SILICON DERIVATIVE;

ATOMIC FORCE MICROSCOPY; CHEMISTRY; CRYSTALLIZATION; ELECTRON; GAS; INSTRUMENTATION; KINETICS; METHODOLOGY; NANOTECHNOLOGY; REVIEW; SCANNING ELECTRON MICROSCOPY;

CARBON; CARBON COMPOUNDS, INORGANIC; CRYSTALLIZATION; ELECTRONS; GASES; IONS; KINETICS; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOPARTICLES; NANOSTRUCTURES; NANOTECHNOLOGY; SILICON; SILICON COMPOUNDS;

EID: 33644922253 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200500113 Document Type: Review

Times cited : (344)

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