Statistical variation analysis of sub- 5-nm -sized electron-beam-induced deposits

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 618-622

  Van Dorp, W F ^a   Van Someren, B ^a   Hagen, C W ^a   Kruit, P ^a   Crozier, P A ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-BEAM-INDUCED DEPOSITS; REGULAR ARRAYS; STANDARD DEVIATION;

DEPOSITION; POISSON DISTRIBUTION; STATISTICAL METHODS; TUNGSTEN;

ELECTRON BEAMS;

EID: 33645532231     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2170099     Document Type: Article

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