Focused electron beam induced deposition of DUV transparent SiO 2

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Perentes, Alexandre ^a   Hoffmann, Patrik ^a   Munnik, Frans ^b  

^a EPFL   (Switzerland)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Focused electron beam induced deposition; Mask repair; Oxygen assisted; Pure materials; SiO 2

Indexed keywords

AMORPHOUS CARBONACEOUS MATRIX; FOCUSED ELECTRON BEAM INDUCED DEPOSITION; MASK REPAIR; NANODEVICES; PURE MATERIALS;

AMORPHOUS CARBON; DEPOSITION; FOCUSED ION BEAMS; ION BOMBARDMENT; MASKS; PHASE COMPOSITION;

SILICA;

EID: 35648978960     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.736918     Document Type: Conference Paper

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