Erratum to: "FIB-milling of photonic structures and sputtering simulation" [Microelectron. Eng. 83 (2006) 1805-1808] (DOI:10.1016/j.mee.2006.01.176);FIB-milling of photonic structures and sputtering simulation

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1805-1808

  Nellen, Philipp M ^a   Callegari, Victor ^a   Brönnimann, Rolf ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Analytical sputtering simulation; Focused ion beam structuring; Fresnel lens; Photonic crystal mask

Indexed keywords

COMPUTER SIMULATION; ETCHING; ION BEAMS; LENSES; MILLING (MACHINING); SPUTTERING;

ANALYTICAL SPUTTERING SIMULATION; FOCUSED ION BEAM STRUCTURING; FRESNEL LENS; PHOTONIC CRYSTAL MASK;

PHOTONS;

EID: 33646057402     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.03.011     Document Type: Erratum

References (8)

1. P.M. Nellen, R. Brönnimann, Meas. Sci. Technol. 2006.
2. Tseng A. J. Micromech. Microeng. 14 (2004) R15
3. Schiappelli F., et al. Microelectron. Eng. 73-74 (2004) 397
4. Fu Y.-Q., et al. Opt. Exp. 7 (2000) 141
5. Orloff J., Utlaut M., and Swanson L. High Resolution Focused Ion Beams (2003), Kluwer, New York, NY
6. Biersack J.P., and Ziegler J.F. The Stopping and Ranges of Ions in Matter vol. 1 (1985), Pergamon Press, Oxford
7. Lacour F., et al. Opt. Mat. 27 (2005) 1421
8. Morgan B., et al. J. Microelectromech. Sys. 13 (2004) 113