High resolution radially symmetric nanostructures from simultaneous electron beam induced etching and deposition

Nanotechnology

Volumn 19, Issue 2, 2008, Pages

  Lobo, Charlene J ^a,b   Toth, Milos ^c   Wagner, Raymond ^c   Thiel, Bradley L ^a   Lysaght, Michael ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b UNIVERSITY OF TECHNOLOGY SYDNEY   (Australia)

^c Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBATES; DEPOSITION; ELECTRON BEAMS; ETCHING; GROWTH (MATERIALS); MAGNETOELECTRONICS;

ELECTRON BEAM INDUCED DEPOSITION (EBID); ELECTRON BEAM INDUCED ETCHING (EBIE); PLASMONICS;

NANOSTRUCTURES;

NANOMATERIAL;

ARTICLE; CHEMICAL REACTION; ELECTRON BEAM; ELECTRON TRANSPORT; MATHEMATICAL MODEL; PARTICLE SIZE; PRIORITY JOURNAL;

EID: 36849009580     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/02/025303     Document Type: Article

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