Electron beam induced deposition of rhodium from the precursor [RhCl(PF3)2]2: Morphology, structure and chemical composition

Journal of Crystal Growth

Volumn 265, Issue 3-4, 2004, Pages 619-626

  Cicoira, F ^a,c   Leifer, K ^a   Hoffmann, P ^a   Utke, I ^a   Dwir, B ^a   Laub, D ^a   Buffat, P A ^a   Kapon, E ^a   Doppelt, P ^b  

^a EPFL   (Switzerland)

^b CNRS   (France)

^c CNR   (Italy)

Author keywords

A3. Chemical vapor deposition processes; A4. Electron energy loss spectroscopy; A5. Transmission electron microscopy; B1. Nano materials

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL GROWTH; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

BULK MATERIALS; ELECTRON BEAM INDUCED DEPOSITION;

RHODIUM COMPOUNDS;

EID: 1942536985     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.02.006     Document Type: Article

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