5-nm-Order electron-beam lithography for nanodevice fabrication

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3767-3771

  Yamazaki, Kenji ^a   Namatsu, Hideo ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

Electron beam nanolithography; Hydrogen; Knife edge; Monte Carlo simulation; Secondary electron; Silsesquioxane

Indexed keywords

ELECTRON BEAM NANOLITHOGRAPHY; HYDROGEN SILSESQUIOXANES (HSQ); KNIFE EDGE; LINE EDGE ROUGHNESS (LER); SECONDARY ELECTRON;

ANISOTROPY; COMPUTER SIMULATION; ELECTRON OPTICS; MONTE CARLO METHODS; NANOTECHNOLOGY; SCATTERING; SILICON WAFERS; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON BEAM LITHOGRAPHY;

EID: 4444262931     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3767     Document Type: Conference Paper

References (7)

1. for example, Y. Takahashi, Y. Ono, A. Fujiwara and H. Inokawa: J. Phys.: Condens. Matter 14 (2002) R995.
2. W. Chen and H. Ahmed: Appl. Phys. Lett. 62 (1993) 1499.
3. S. Yasin, D. G. Hasko and H. Ahmed: Appl. Phys. Lett. 78 (2001) 2760.
4. K. Yamazaki and H. Namatsu: Jpn. J. Appl. Phys. 42 (2003) L491.
5. K. Yamazaki, K. Kurihara, T. Yamaguohi, H. Namatsu and M. Nagase: Jpn. J. Appl. Phys. 36 (1997) 7552.
6. H. Namatsu, T. Yamaguchi, M. Nagase, K. Yamazaki and K. Kurihara: Microelectron. Eng. 41/42 (1998) 331.
7. H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase and K. Kurihara: J. Vac. Sci. & Technol. B 16 (1998) 69.