Focused ion beam sculpting curved shape cavities in crystalline and amorphous targets

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 4, 2006, Pages 1766-1775

  Adams, D P ^a   Vasile, M J ^a   Mayer, T M ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURVED SHAPE CAVITIES; HIGH-ENERGY BEAM; REDEPOSITION; YAMAMURA PARAMETERS;

AMORPHOUS MATERIALS; MICROELECTRONICS; MOLECULAR STRUCTURE; NANOTECHNOLOGY; SPATIAL VARIABLES CONTROL; SPUTTER DEPOSITION; WAVE EQUATIONS;

ION BEAMS;

EID: 33746558663     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2210000     Document Type: Article

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