Approaching the resolution limit of nanometer-scale electron beam-induced deposition

Nano Letters

Volumn 5, Issue 7, 2005, Pages 1303-1307

  Van Dorp, Willem F ^a   Van Someren, Bob ^a   Hagen, Cornells W ^a   Kruit, Pieter ^a   Crozier, Peter A ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM-INDUCED DEPOSITION; HIGH-RESOLUTION PATTERNING; PRECURSORS; SCANNING PROBE LITHOGRAPHY;

ELECTRON BEAMS; FABRICATION; LITHOGRAPHY; SPECTRUM ANALYSIS; STATISTICAL METHODS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

NANOSTRUCTURED MATERIALS;

NANOMATERIAL; TUNGSTEN;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRON; EVALUATION; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY;

CRYSTALLIZATION; ELECTRONS; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES; TUNGSTEN;

EID: 23144465269     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl050522i     Document Type: Article

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