Characteristics of nano electron source fabricated using beam assisted process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 3, 2004, Pages 1266-1268

  Murakami, Katsuhisa ^a   Takai, Mikio ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ELECTRODEPOSITION; IMAGE SENSORS; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; VACUUM;

FIELD EMISSION DISPLAYS (FED); FOCUSED ION BEAMS (FIB); MAGNETIC SENSORS; NANA ELECTRON SOURCE;

ELECTRON BEAMS;

EID: 3242689832     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1669652     Document Type: Conference Paper

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