Density determination of focused-electron-beam-induced deposits with simple cantilever-based method

Applied Physics Letters

Volumn 88, Issue 3, 2006, Pages 1-3

  Utke, I ^a   Friedli, V ^a   Michler, J ^a   Bret, T ^b   Multone, X ^b   Hoffmann, P ^b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; COMPOSITION; SILANES; SILICON; THERMODYNAMIC STABILITY;

CANTILEVER-BASED METHOD; DENSITY DETERMINATION; DEPOSIT MASS DETERMINATION; TETRAMETHOXYSILANE;

ELECTRON DENSITY MEASUREMENT;

EID: 31144451130     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2158516     Document Type: Article

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