Modeling resist heating in mask fabrication using a multilayer Green's function approach

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 206-212

  Chu, Dachen ^a   Fabian, R ^a   Pease W , ^a   Goodson, Kenneth E ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

Green's function; Mask fabrication; Resist heating

Indexed keywords

ELECTRON BEAMS; GREEN'S FUNCTION; MATHEMATICAL MODELS; MULTILAYERS; PHOTORESISTS; THERMAL DIFFUSION;

MASK FABRICATION;

MASKS;

EID: 0036030859     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473459     Document Type: Conference Paper

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