Surface kinetic study of ion-induced chemical vapor deposition of copper for focused ion beam applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 6, 1997, Pages 3104-3114

  Chiang, T P ^a   Sawin, H H ^a   Thompson, C V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CALCULATIONS; COPPER; DESORPTION; ION BEAMS; KINETIC THEORY; LASER APPLICATIONS; MATHEMATICAL MODELS; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY;

ION INDUCED CHEMICAL VAPOR DEPOSITION; LASER INDUCED THERMAL DESORPTION; QUARTZ CRYSTAL MICROBALANCE MEASUREMENT;

CHEMICAL VAPOR DEPOSITION;

EID: 0031273646     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580853     Document Type: Article

References (29)

1. K. Gamo, N. Takakura, N. Samoto, R. Shimizu, and S. Namba, Jpn. J. Appl. Phys., Part 1 23, L293 (1984).
2. K. Gamo and S. Namba, Mater. Res. Soc. Symp. Proc. 131, 531 (1989).
3. For review of subject: J. Melngailis, P. G. Blauner, A. D. Dubner, J. S. Ro, T. Tao, and C. V. Thompson, 2nd Inter. Symp. Process Phys. Modeling, 653 (1990).
4. D. J. Ehrlich and J. Y. Tsao, Laser Microfabrication (Academic, San Diego, CA, 1989).
5. V. Scheuer, H. Koops, and T. Tschudi, Microelectron. Eng. 5, 423 (1986).
6. P. G. Blauner, J. S. Ro, Y. Butt, and J. Melngailis, J. Vac. Sci. Technol. B 7, 609 (1989).
7. A. D. Dubner, A. Wagner, J. Melngailis, and C. V. Thompson, J. Appl. Phys. 70, 665 (1991).
8. A. D. Dubner, Ph.D Thesis, Massachusetts Institute of Technology, 1990 (unpublished).
9. J. S. Ro, C. V. Thompson, and J. Melngailis, J. Vac. Sci. Technol. B 12, 73 (1994).
10. H. R. Kaufman, Fundamentals of Ion-Source Operation (Commonwealth Scientific Co., Alexandria, VA, 1984).
11. A. Wajid, Rev. Sci. Instrum. 62, 2026 (1991).
12. For review of subject: B. W. Rossiter and R. C. Baetzold, Physical Methods of Chemistry Vol IXA (Wiley, New York, 1993), Vol. IXA.
13. D. R. Burgess, Jr., I. Hussla, P. C. Stair, R. Viswanathan, and E. Weitz, Rev. Sci. Instrum. 55, 1771 (1984).
14. D. Burgess, Jr., P. C. Stair, and E. Weitz, J. Vac. Sci. Technol. A 4, 1362 (1986).
15. L. H. Dubois, P. M. Jeffries, and G. S. Girolami, Mater. Res. Soc. Symp. Proc. 7, 375 (1992).
16. C. D. Wagner, Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer, Eden Prairie, MN, 1979).
17. A. D. Della Ratta, J. Melngailis, and C. V. Thompson, J. Vac. Sci. Technol. B 11, 2195 (1993).
18. P. G. Blauner, Y. Butt, J. S. Ro, C. V. Thompson, and J. Melngailis, J. Vac. Sci. Technol. B 7, 1816 (1989).
19. F. L. Ross, Ph.D. Thesis, Massachusetts Institute of Technology, 1997 (unpublished).
20. Eight Peak Index of Mass Spectra (The Mass Spectrometry Data Centre, UK, 1983).
21. G. S. Girolami, P. M. Jeffries, and L. H. Dubois, J. Am. Chem. Soc. 115, 1015 (1993).
22. T. P. Chiang, Ph.D. Thesis, Massachusetts Institute of Technology, 1996 (unpublished).
23. B. J. Hinch and L. H. Dubois, J. Electron Spectrosc. Relat. Phenom. 54/55, 759 (1990).
24. H. Antonsson, A. Nilsson, N. Martensson, I. Panas, and P. E. M. Siegbahn, J. Electron Spectrosc. Relat. Phenom. 54/55, 601 (1990).
25. M. E. Gross and V. M. Donnelly, Mater. Res. Soc. Symp. Proc. 7, 355 (1992).
26. V. M. Donnelly and M. E. Gross, J. Vac. Sci. Technol. A 11, 66 (1993).
27. J. A. T. Norman, B. A. Muratore, P. N. Dyer, D. A. Roberts, and A. K. Hochberg, J. Phys. IV 2, 271 (1991).
28. T. P. Chiang, H. H. Sawin, and C. V. Thompson, J. Vac. Sci. Technol. A 15, 2677 (1997).
29. J. Farkas, M. J. Hampden-Smith, and T. T. Kodas, J. Electrochem. Soc. 141, 3539 (1994).