Focused ion beam micro- and nanoengineering

MRS Bulletin

Volumn 32, Issue 5, 2007, Pages 417-423

  Langford, Richard M ^a   Nellen, Philipp M ^a   Gierak, Jacques ^a   Fu, Yongqi ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAM LITHOGRAPHY; ION IMPLANTATION; MASKS; MICROMANIPULATORS; NANOTECHNOLOGY;

CONVENTIONAL PROCESSING TECHNIQUES; DUAL-PLATFORM SYSTEMS; MASKLESS MILLING; NANOENGINEERING;

FOCUSED ION BEAMS;

EID: 34249784526     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs2007.65     Document Type: Review

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