Resolution limit for electron beam-induced deposition on thick substrates

Scanning

Volumn 28, Issue 4, 2006, Pages 204-211

  Hagen, C W ^a   Silvis Cividjian, N ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Electron beam induced deposition; Monte Carlo simulations; Nanolithography; Secondary electrons; Spatial resolution

Indexed keywords

ELECTRON EMISSION; FABRICATION; MONTE CARLO METHODS; NANOTECHNOLOGY; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON BEAM-INDUCED DEPOSITION; SECONDARY ELECTRONS; SPATIAL RESOLUTION;

ELECTRON BEAMS;

ADSORPTION; ARTICLE; CALCULATION; DENSITY; DISSOCIATION; ELECTRON BEAM; ELECTRON BEAM INDUCED DEPOSITION; ELECTRON TRANSPORT; ENERGY; MASS; MATHEMATICAL ANALYSIS; MICROSCOPE; MONTE CARLO METHOD; NANOLITHOGRAPHY; NANOTECHNOLOGY; PARTICLE SIZE; PRIORITY JOURNAL; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON BEAMS;

EID: 33747051244     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: 10.1002/sca.4950280402     Document Type: Article

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