Measurement and simulation of impinging precursor molecule distribution in focused particle beam deposition/etch systems

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1499-1502

  Utke, Ivo ^a   Friedli, Vinzenz ^a,b   Amorosi, Simone ^b   Michler, Johann ^a   Hoffmann, Patrik ^b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

Deposition; Effusion; Etching; Focused electron beam; Focused ion beam; Gas injection system; Precursor distribution

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; ELECTRON BEAMS; ETCHING; MEASUREMENT THEORY; MOLECULAR STRUCTURE; MONTE CARLO METHODS; PROFILOMETRY; PYROLYSIS;

EFFUSION; FOCUSED ELECTRON BEAMS; GAS INJECTION SYSTEMS; PRECURSOR DISTRIBUTION;

PARTICLE BEAMS;

EID: 33748268727     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.136     Document Type: Article

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