Controlled focused electron beam-induced etching for the fabrication of sub-beam-size nanoholes

Applied Physics Letters

Volumn 92, Issue 4, 2008, Pages

  Miyazoe, Hiroyuki ^a,b   Utke, Ivo ^a   Michler, Johann ^a   Terashima, Kazuo ^b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; ELECTRON BEAMS; ETCHING; TUNGSTEN;

INCIDENT BEAMS; KNIFE EDGE MEASUREMENTS; POINT DETECTION; SUB-BEAM-SIZE NANOHOLES;

NANOSTRUCTURES;

EID: 38849111378     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2839334     Document Type: Article

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