A new write head trimmed at wafer level by focused ion beam

IEEE Transactions on Magnetics

Volumn 34, Issue 4 PART 1, 1998, Pages 1471-1473

  Koshikawa, T ^a   Nagai, A ^a   Yokoyama, Y ^a   Hoshino, T ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Fib, mr, trimming, write head

Indexed keywords

ALUMINA; ION BEAMS; MAGNETORESISTANCE; SENSORS;

FOCUSED ION BEAM; MAGNETORESISTIVE SENSORS;

MAGNETIC HEADS;

EID: 0032121183     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.706586     Document Type: Article

References (8)

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