Electron beam assisted chemical etching of single-crystal diamond substrates with hydrogen gas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7691-7695

  Taniguchi, Jun ^a   Miyamoto, Iwao ^a   Ohno, Naoto ^a   Kantani, KeN'Ichi ^a   Komuro, Masanori ^b   Hiroshima, Hiroshi ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

Direct fine pattern etching; Electron beam assisted chemical etching; Hydrogen gas; Oxygen gas; Raman scattering; Scanning electron microscope; Single crystal diamond substrates

Indexed keywords

ELECTRON BEAMS; ETCHING; HYDROGEN; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SYNTHETIC DIAMONDS;

DIRECT FINE PATTERN ETCHING; ELECTRON BEAM ASSISTED CHEMICAL ETCHING (EBACE) METHOD;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031345570     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7691     Document Type: Article

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