Properties and applications of cobalt-based material produced by electron-beam-induced deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 4, 2002, Pages 1295-1302

  Lau, Y M ^a   Chee, P C ^a   Thong, J T L ^a   Ng, V ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; ELECTRON BEAMS; GRAIN SIZE AND SHAPE; LOW TEMPERATURE EFFECTS; MICROSCOPIC EXAMINATION; NANOSTRUCTURED MATERIALS;

ELECTRON BEAM INDUCED DEPOSITION; MAGNETIC FORCE MICROSCOPY; MATERIAL RESISTIVITY; SELECTIVE MATERIAL DEPOSITS;

COBALT COMPOUNDS;

EID: 0036648348     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1481040     Document Type: Article

References (19)