The role of secondary electrons in electron-beam-induced-deposition spatial resolution

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 693-699

  Silvis Cividjian, N ^a   Hagen, C W ^a   Leunissen, L H A ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Electron beam induced deposition; Monte Carlo simulations; Profile simulator; Secondary electrons; Spatial resolution

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; ELECTRON BEAMS; ELECTRON MICROSCOPY; ELECTRON SCATTERING; MONTE CARLO METHODS; NANOTECHNOLOGY;

SECONDARY ELECTRONS;

MICROELECTRONICS;

EID: 0036643634     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00515-4     Document Type: Conference Paper

References (16)