Electron-beam-induced deposition of copper compound with low resistivity

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3887-3891

  Ochiai, Yukinori ^a   Fujita, Jun Ichi ^a   Matsui, Shinji ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5344279148     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588687     Document Type: Article

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