Growth behavior near the ultimate resolution of nanometer-scale focused electron beam-induced deposition

Nanotechnology

Volumn 19, Issue 22, 2008, Pages

  Van Dorp, W F ^a   Hagen, C W ^a   Crozier, P A ^b   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FULL WIDTH AT HALF MAXIMUM; GROWTH (MATERIALS); NUCLEATION; OPTICAL RESOLVING POWER; STATISTICAL METHODS;

ELECTRON BEAM-INDUCED DEPOSITION (EBID); GROWTH BEHAVIOR; SINGLE MOLECULES;

ELECTRON BEAMS;

CARBON MONOXIDE; TUNGSTEN;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRON BEAM; ELECTRON BEAM INDUCED DEPOSITION; GROWTH RATE; IMAGE ANALYSIS; IMAGE PROCESSING; NANOTECHNOLOGY; NONHUMAN; POISSON DISTRIBUTION; PRIORITY JOURNAL; SIGNAL TRANSDUCTION; STATISTICAL ANALYSIS;

EID: 43249104389     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/22/225305     Document Type: Article

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