The growth behavior of self-standing tungsten tips fabricated by electron-beam-induced deposition using 200 keV electrons

Journal of Applied Physics

Volumn 96, Issue 7, 2004, Pages 3983-3986

  Liu, Z Q ^a   Mitsuishi, K ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ELECTRON BEAMS; ION BEAMS; LITHOGRAPHY; LOW ENERGY ELECTRON DIFFRACTION; MONTE CARLO METHODS; MORPHOLOGY; SATURATION (MATERIALS COMPOSITION); SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

DEEP TOPOGRAPHIC STRUCTURES; ELECTRON-BEAM INDUCED DEPOSITION (EBID); SCANNING TRANSMISSION ELECTRON MICROSCOPE; TUNGSTEN TIPS;

TUNGSTEN;

EID: 7044241457     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1788844     Document Type: Article

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