Surface chemistry and optimization of focused ion beam iodine-enhanced etching of indium phosphide

Applied Surface Science

Volumn 253, Issue 22, 2007, Pages 8969-8973

  Callegari, Victor ^a   Nellen, Philipp M ^a   Yang, Tianhe ^a   Hauert, Roland ^a   Müller, Ulrich ^a   Hernández Ramírez, Francisco ^b   Sennhauser, Urs ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Beam scanning strategy; Focused ion beam; Gas enhanced etching; Indium phosphide; Sputtering rate

Indexed keywords

DESORPTION; INDIUM PHOSPHIDE; OPTIMIZATION; SPUTTERING; SURFACE CHEMISTRY;

BEAM SCANNING STRATEGY; GAS ENHANCED ETCHING; ROOM TEMPERATURE; SPUTTERING RATE;

FOCUSED ION BEAMS;

EID: 34547845345     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.05.026     Document Type: Article

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