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Chemical Vapor Deposition

Volumn 4, Issue 3, 1998, Pages 92-94

Near-Room Temperature Thermal CVD of SiO2 Films

(2) Senkevich, Jay J a Desu, Seshu B a

a State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; SILICA;

LOW THERMAL BUDGETING; NEAR ROOM TEMPERATURE THERMAL CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 0032070366 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-3862(199805)04:03<92::AID-CVDE92>3.0.CO;2-C Document Type: Article

Times cited : (11)

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