Advanced photolithographic mask repair using electron beams

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 3101-3105

  Liang, Ted ^a   Frendberg, Eric ^a   Lieberman, Barry ^a   Stivers, Alan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

32 NM TECHNOLOGY; ELECTRON BEAM INDUCED DEPOSITION; MASK REPAIR; PHASE SHIFT MASKS;

DEPOSITION; ELECTRON BEAMS; ETCHING; PHASE SHIFT; PHOTOLITHOGRAPHY; REPAIR;

MASKS;

EID: 29044450092     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2062428     Document Type: Article

References (17)

1. International Technology Roadmap for Semiconductors 2004 Update 〈 http://www.itrs.net/Common/2004Update/2004Update.htm 〉
2. A. Wagner, R. Haight, and P. Longo, Proc. SPIE 4889, 457 (2002).
3. T. Liang, A. Stivers, R. Livengood, P. Yan, G. Zhang, and F. Lo, J. Vac. Sci. Technol. B 18, 3214 (2000).
4. J. Melngalis, J. Vac. Sci. Technol. B B5, 469 (1987).
5. R. White, M. Verbeek, R. Bozak, and M. Klos, Proc. SPIE 4562, 213 (2002).
6. T. Liang and A. Stivers, Proc. SPIE 4688, 375 (2002).
7. K. Edinger, J. Vac. Sci. Technol. B 22, 292 (2004).
8. T. Liang, Proc. SPIE 5446, 291 (2004).
9. T. Liang, E. Frendberg, D. Bald, M. Penn, and A. Stivers, Proc. SPIE 5567, 456 (2004).
10. Y. Itou, Proc. SPIE 5445, 301 (2004).
11. K. Edinger, Proc. SPIE 5130, 383 (2003).
12. T. Liang, A. Stivers, G. Liu, G. Dao, V. Liberman, M. Rothschild, S. T. Palmacci, and L. Scipioni, Proceedings 2nd International Symposium on 157 nm Lithography, Dana Point, CA, May 2001.
13. M. Kureishi, Proc. SPIE 5751, 158 (2005).
14. B. Lin, S. Hsu, I. H. Huang, K. Chen, F. Hsieh, T. Hsu, H. Liu, A. Kroyan, F. Hsu, and J. Huang, Proc. SPIE 5256, 103 (2003).
15. D. Attwood, Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, Cambridge, UK, 1999).
16. P. Yan, G. Zhang, E. Spiller, and P. Mirkarimi, Proc. SPIE 5446, 824 (2004).
17. T. Liang, A. Stivers, P. Yan, E. Tejnil, and G. Zhang, Proc. SPIE 4562, 288 (2002).