Resolution in focused electron- and ion-beam induced processing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2219-2223

  Utke, Ivo ^a   Friedli, Vinzenz ^a,b   Purrucker, Martin ^a   Michler, Johann ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; DEPOSITION; DESORPTION; ETCHING; SCALING LAWS; SILICON; SURFACE DIFFUSION;

PHYSICAL PROCESSES; REPLENISHMENT;

FOCUSED ION BEAMS;

EID: 37149048101     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2789441     Document Type: Article

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