Investigation of a microtriode with a planar field emitter-extractor source fabricated by direct-write nanolithography using electron beam induced deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 781-785

  Sellmair, Josef ^a   Edinger, Klaus ^a   Koops, Hans W P ^a  

^a NaWoTec GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON OPTICS; OPTICS; TRANSCONDUCTANCE; VACUUM;

DEPOSITED EMITTERS; ELECTRON BEAM DEPOSITION;

NANOTECHNOLOGY;

EID: 31144458328     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1875332     Document Type: Conference Paper

References (4)

1. EO-3D version 2.0 of MEBS (Munro's Electron Beam software Ltd., London, 1994).
2. H. G. König and H. Koops, Proceedings International Conference Microcircuit Engineering, Berlin 1984, edited by, A. Heuberger, and, H. Beneking, (Academic, New York 1985), pp. 195-202.
3. H. W. P. Koops, J. Kretz, M. Rudolph, M. Weber, G. Dahm, and K. L. Lee, Jpn. J. Appl. Phys., Part 1, 33 7099 (1994).
4. Klaus Edinger, Volker Boegli, Michael Budach, Ottmar Hoinkis, Bernd Weyrauch, Hans W. P. Koops, Johannes Bihr, and Jens Greiser, Proc. SPIE 4889, 283 (2002).