Field emitter array fabricated using focused ion and electron beam induced reaction

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 2, 2000, Pages 976-979

  Yavas, O ^a   Ochiai, C ^a   Takai, M ^a   Park, Y K ^a   Lehrer, C ^b   Lipp, S ^b   Frey, L ^b   Ryssel, H ^b   Hosono, A ^c   Okuda, S ^c  

^a OSAKA UNIVERSITY   (Japan)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^c MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; FOCUSING; INTERFACES (MATERIALS); ION IMPLANTATION; NIOBIUM; PLATINUM; REACTIVE ION ETCHING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SPUTTERING;

FIELD EMITTER ARRAYS; FOWLER-NORDHEIM THEORY;

FIELD EMISSION CATHODES;

EID: 0034155389     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591310     Document Type: Article

References (12)

1. T. Tao, W. Wilkinson, and J. Melngailis, J. Vac. Sci. Technol. B 9, 162 (1991).
2. H. C. Petzold and P. J. Heard, Microelectron. Eng. 11, 421 (1990).
3. H. Schaffer and B. Breithaupt, Microelectron. Eng. 13, 275 (1991).
4. M. Takai, T. Kishimoto, M. Yamashita, H. Morimoto, S. Yura, A. Hosono, S. Okuda, S. Lipp, L. Frey, and H. Ryssel, J. Vac. Sci. Technol. B 14, 1973 (1996).
5. P. G. Blauner, J. Ro, Y. Butt, and J. Melngailis, J. Vac. Sci. Technol. B 7, 609 (1989).
6. J. Puretz and L. L. W. Swanson, J. Vac. Sci. Technol. B 10, 2695 (1992).
7. K. Gamo, D. Takehara, and Y. Hamamura, Microelectron. Eng. 5, 163 (1986).
8. M. Komuro and H. Hiroshima, Microelectron. Eng. 35, 273 (1997).
9. R. J. Young and J. Puretz, J. Vac. Sci. Technol. B 13, 2576 (1995).
10. S. Lipp, L. Frey, C. Lehrer, B. Frank, E. Demm, S. Pauthner, and H. Ryssel, J. Vac. Sci. Technol. B 14, 3920 (1996).
11. M. Takai, Nucl. Instrum. Methods Phys. Res. B 85, 664 (1994).
12. M. Takai, T. Kishimoto, H. Morimoto, Y. K. Park, S. Lipp, C. Lehrer, L. Frey, H. Ryssel, A. Hosono, and S. Kawabuchi, Microelectron. Eng. 41/42, 453 (1998).