Electron beam induced deposition of metallic tips and wires for microelectronics applications

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 261-264

  Utke, I ^a   Dwir, B ^a   Leifer, K ^a   Cicoira, F ^a   Doppelt, P ^b   Hoffmann, P ^a   Kapon, E ^a  

^a EPFL   (Switzerland)

^b PSL RESEARCH UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR QUANTUM WIRES;

COMPOSITION ANALYSIS; ELECTRON BEAM INDUCED DEPOSITION; RESISTIVITY RATIO;

MICROELECTRONIC PROCESSING;

EID: 0034206448     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00311-7     Document Type: Article

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