Etching characteristics of chromium thin films by an electron beam induced surface reaction

Semiconductor Science and Technology

Volumn 18, Issue 4, 2003, Pages 199-205

  Wang, Jianhua ^a   Griffis, D P ^b   Garcia, R ^b   Russell, P E ^b  

^a KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; ELECTRON BEAMS; ELECTRON IRRADIATION; ETCHING; FLOW OF FLUIDS; GRAIN SIZE AND SHAPE; PHOTOLITHOGRAPHY; XENON;

CHROMIUM THIN FILMS;

THIN FILMS;

EID: 0037392463     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/18/4/302     Document Type: Article

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