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Volumn 103, Issue 1, 2005, Pages 17-22
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Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition
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Author keywords
Electron beam induced deposition; Monte Carlo modeling; Nano fabrication
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Indexed keywords
COMPUTER SIMULATION;
ELECTRON SCATTERING;
MONTE CARLO METHODS;
ACCELERATING VOLTAGES;
BULK SUBSTRATES;
ELECTRON-BEAM-INDUCED DEPOSITION;
MONTE CARLO PROFILE SIMULATORS;
ELECTRON BEAMS;
CHEMICAL STRUCTURE;
CONFERENCE PAPER;
ELECTRIC POTENTIAL;
ELECTRON BEAM;
ELECTRON TRANSPORT;
ENERGY TRANSFER;
MATHEMATICAL COMPUTING;
MOLECULAR DYNAMICS;
MONTE CARLO METHOD;
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EID: 14944366469
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ultramic.2004.11.011 Document Type: Conference Paper |
Times cited : (38)
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References (16)
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