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Volumn 103, Issue 1, 2005, Pages 17-22

Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition

Author keywords

Electron beam induced deposition; Monte Carlo modeling; Nano fabrication

Indexed keywords

COMPUTER SIMULATION; ELECTRON SCATTERING; MONTE CARLO METHODS;

EID: 14944366469     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2004.11.011     Document Type: Conference Paper
Times cited : (38)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.