Direct fabrication of nanowires in an electron microscope

Applied Physics Letters

Volumn 82, Issue 20, 2003, Pages 3514-3516

  Silvis Cividjian, N ^a   Hagen, C W ^a   Kruit, P ^a   Stam, M A J V D ^b   Groen, H B ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON IRRADIATION; ELECTRON MICROSCOPES; FABRICATION; MICROELECTRONICS; MOLECULAR BIOLOGY; PHOTONS;

NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 0037643522     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1575506     Document Type: Article

References (17)

1. A. N. Broers, W. W. Molzen, J. J. Cuomo, and N. D. Wittels, Appl. Phys. Lett. 29, 596 (1976).
2. H. W. P. Koops, J. Kretz, M. Rudolph, M. Weber, G. Dahm, and K. L. Lee, Jpn. J. Appl. Phys. 33, 7099 (1994).
3. H. W. P. Koops, E. Dobisz, and J. Urban, J. Vac. Sci. Technol. B 15, 1369 (1997).
4. C. Schoessler and H. W. P. Koops, J. Vac. Sci. Technol. B 16, 862 (1998).
5. K. T. Kohlmann-von Platen, J. Chlebek, M. Weiss, K. Reimer, H. Oertel, and W. H. Brünger, J. Vac. Sci. Technol. B 11, 2219 (1993).
6. M. Komuro and H. Hiroshima, Microelectron. Eng. 35, 273 (1997).
7. K. I. Schiffmann, Nanotechnology 4, 163 (1993).
8. U. Hübner, R. Plontke, M. Blume, A. Reinhardt, and H. W. P. Koops, Microelectron. Eng. 57-58, 953 (2001).
9. N. Silvis-Cividjian, C. W. Hagen, L. H. A. Leunissen, and P. Kruit, Microelectron. Eng. 61-62, 693 (2002).
10. N. Silvis-Cividjian, Ph.D. thesis, DUP Science, Delft, 2002.
11. M. Weber, J. Phys. D 27, 1363 (1994).
12. L. Reimer, Scanning Electron microscopy (Springer, Berlin, 1990).
13. This profile simulator will be described in a separate article.
14. E. D. Boyes, J. Ringnalda, M. A. J. van der Stam, T. F. Fliervoet, and E. A. van Cappellen, Microsc. Microanal. 7, Suppl. 2, 232 (2001).
15. 4 electrons in a 1-nm pixel), needed to write nanometer lines in resist-based electron-beam lithography.
16. X.-D. Wang, S. Rubel, U. Purbach, and A. L. de Lozanne, Proc. SPIE 3009, 2 (1997).
17. P. D. Szkutnik, A. Piednoir, A. Ronda, F. Marchi, D. Tonneau, H. Dallaporta, and M. Hanbücken, Appl. Surf. Sci. 164, 169 (2000).