Electron-beam-based photomask repair

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2902-2906

  Edinger, Klaus ^a   Becht, Hans ^a   Bihr, Johannes ^b   Boegli, Volker ^a   Budach, Michael ^a   Hofmann, Thorsten ^a   Koops, Hans W P ^a   Kuschnerusr, Peter ^b   Oster, Jens ^a   Spies, Petra ^a   Weyrauch, Bernd ^a  

^a NaWoTec GmbH   (Germany)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATION; ELECTRON MICROSCOPY; ETCHING; IMAGING TECHNIQUES; LITHOGRAPHY; QUARTZ; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY;

ELECTRON-BEAM PROJECTION; MASK REPAIR; PHOTOMASKS; STENCIL MASKS;

ELECTRON BEAMS;

EID: 19944430670     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1808711     Document Type: Conference Paper

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