Carbon nanopillar laterally grown with electron beam-induced chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2990-2993

  Fujita, J ^a   Ishida, M ^b   Ichihashi, T ^b   Ochiai, Y ^b   Kaito, T ^c   Matsui, S ^d  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b NEC CORPORATION   (Japan)

^c SEIKO INSTRUMENTS INC   (Japan)

^d UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CARBON; CATALYSTS; CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; ELECTRON SCATTERING; ENERGY DISPERSIVE SPECTROSCOPY; GRAPHITIZATION; HIGH TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAMS (FIB); GAS PRESSURE; MICROVACUUM TUBES;

GROWTH (MATERIALS);

EID: 0942289203     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1624259     Document Type: Conference Paper

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