Thermal nano-probe

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 737-748

  Rangelow, I W ^a   Gotszalk, T ^a,c   Abedinov, N ^a   Grabiec, P ^a,d   Edinger, K ^b  

^a UNIVERSITY OF KASSEL   (Germany)

^b UNIVERSITY OF MARYLAND   (United States)

^c WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^d ukasiewicz Research Network Institute of Microelectronics and Photonics   (Germany)

Author keywords

Focused ion electron beam technology; Nanofabrication; Scanning thermal microscopy; Thermal nano probe

Indexed keywords

ATOMIC FORCE MICROSCOPY; CMOS INTEGRATED CIRCUITS; DEPOSITION; ELECTRON BEAMS; ION BEAM LITHOGRAPHY; MICROMACHINING; NANOTECHNOLOGY; OPTICAL RESOLVING POWER;

ATOMIC FORCE SCANNING PROBES; THERMAL PROBES;

PROBES;

EID: 0035450343     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00466-X     Document Type: Article

References (12)