Accurate focused ion beam sculpting of silicon using a variable pixel dwell time approach

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 836-844

  Adams, D P ^a   Vasile, M J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAM SCULPTING; ION MILLING; SPATIAL DISTRIBUTION;

ION BEAM ASSISTED DEPOSITION; ION BEAMS; OPTIMIZATION; SPUTTER DEPOSITION;

SILICON;

EID: 33645505116     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2184325     Document Type: Article

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