Electron range effects in focused electron beam induced deposition of 3D nanostructures

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1482-1486

  Bret, Tristan ^a   Utke, Ivo ^a   Hoffmann, Patrik ^a   Abourida, Maurice ^b   Doppelt, Pascal ^b  

^a EPFL   (Switzerland)

^b CNRS   (France)

Author keywords

3D structures; Electron scattering; Focused electron beam induced deposition

Indexed keywords

DEPOSITION; ELECTRON BEAMS; ELECTRON SCATTERING; MICROSTRUCTURE; THIN FILM CIRCUITS;

3D STRUCTURES; ACCELERATION VOLTAGES; DEPOSITION SEQUENCE; FOCUSED ELECTRON BEAM INDUCED DEPOSITION;

NANOSTRUCTURED MATERIALS;

EID: 33646047144     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.146     Document Type: Article

References (37)

1. Kreuzer P. Optik 78 (1988) 158-164
2. Lehmann O., and Stuke M. Appl. Phys. A 53 (1991) 343-345
3. Matsui S., Kaito T., Fujita J.-I., Komuro M., Kanda K., and Haruyama Y. J. Vac. Sci. Technol. B 18 (2000) 3181-3184
4. Hoyle P.C., Cleaver J.R.A., and Ahmed H. J. Vac. Sci. Technol. B 14 (1996) 662-673
5. Utke I., Hoffmann P., Dwir B., Leifer K., Kapon E., and Doppelt P. J. Vac. Sci. Technol. B 18 (2000) 3168-3171
6. Floreani F., Koops H.W., and Elsasser W. Microelectron. Eng. 57-58 (2001) 1009-1016
7. Utke I., Berger R., Scandella L., and Hoffmann P. Appl. Phys. Lett. 80 (2002) 4792-4794
8. Boero G., Utke I., Bret T., Quack N., Todorova M., Mouaziz S., Kejik P., Brugger J., Popovic R.S., and Hoffmann P. Appl. Phys. Lett. 86 (2005) 042503
9. Castagné M., Benfedda M., Lahimer S., Falgayrettes P., and Fillard J.P. Ultramicroscopy 76 (1999) 187-194
10. Koops H.W.P., Hoinkis O.E., Honsberg M.E.W., Schmidt R., Blum R., Bottger G., Kuligk A., Liguda C., and Eich M. Microelectron. Eng. 57-58 (2001) 995-1001
11. Perentes A., Bachmann A., Leutenegger M., Utke I., Sandu C., and Hoffmann P. Microelectron. Eng. 73-74 (2004) 412-416
12. Edinger K., Becht H., Bihr J., Boegli V., Budach M., Hofmann T., Koops H.W.P., Kuschnerus P., Oster J., Spies P., and Weyrauch B. J. Vac. Sci. Technol. B 22 (2004) 2902-2906
13. Tanaka M., Shimojo M., Han M., Mitsuishi K., and Furuya K. Surf. Interf. Anal. 37 (2005) 261-264
14. van Dorp W.F., van Someren B., Hagen C.W., and Kruit P. NanoLetters 5 (2005) 1303-1307
15. Weber M. J. Phys. D: Appl. Phys. 27 (1994) 1363-1369
16. Hiroshima H., and Komuro M. Jpn. J. Appl. Phys. 36 (1997) 7686-7690
17. Barraud A., Rosilio C., and Ruaudel-Teixier A. J. Vac. Sci. Technol. 16 (1979) 2003-2007
18. Isaacson M.S. Specimen damage in the electron microscope. In: Hayat M.A. (Ed). Principles and Techniques of Electron Microscopy (1977), Van Nostrand-Reinhold
19. Kanaya K., and Okayama S. J. Phys. D: Appl. Phys. 5 (1972) 43-58
20. Kohlmann von Platen K.T., Buchmann L.M., Petzold H.C., and Bruenger W.H. J. Vac. Sci. Technol. B 14 (1996) 4262-4265
21. Liang T., Stivers A., Livengood R., Yan P.-Y., Zhang G., and Lo F.-C. J. Vac. Sci. Technol. B 18 (2000) 3216-3220
22. Hoffmann P., Utke I., Perentes A., Bret T., Santschi C., and Apostolopoulos V. Proc. SPIE 5925 (2005) 1
23. Randolph S.J., Fowlkes J.D., and Rack P.D. J. Appl. Phys. 98 (2005) 034902
24. Utke I., Luisier A., Hoffmann P., Buffat P.A., and Laub D. Appl. Phys. Lett. 81 (2002) 3245-3247
25. F. Cicoira, Ph.D. Thesis No. 2528, EPFL, 2002.
26. Cicoira F., Leifer K., Hoffmann P., Utke I., Dwir B., Laub D., Buffat P.A., Kapon E., and Doppelt P. J. Cryst. Growth 265 (2004) 619-626
27. Bret T., Utke I., and Hoffmann P. Microelectron. Eng. 78-79 (2005) 307-313
28. T. Bret, Ph.D. Thesis No. 3321, EPFL, 2005.
29. Bret T., Utke I., Bachmann A., and Hoffmann P. Appl. Phys. Lett. 83 (2003) 4005-4007
30. Bennett M.A., and Patmore D.J. Inorg. Chem. 10 (1971) 2387-2395
31. Bret T., Mauron S., Utke I., and Hoffmann P. Microelectron. Eng. 78-79 (2005) 300-306
32. Niedrig H. J. Appl. Phys. 53 (1982) R15-R49
33. Bret T., Utke I., Gaillard C., and Hoffmann P. J. Vac. Sci. Technol. B 22 (2004) 2504-2510
34. Bullen A.J., O'Hara K.E., Cahill D.G., Monteiro O., and von Keudell A. J. Appl. Phys. 88 (2000) 6317-6320
35. Luisier A., Utke I., Bret T., Cicoira F., Hauert R., Rhee S.-W., Doppelt P., and Hoffmann P. J. Electrochem. Soc. 151 (2004) C535-C537
36. Snelder R. MIMAR: Archit. Develop. 12 (1984) 66-74
37. Utke I., Friedli V., Michler J., Bret T., Multone X., and Hoffmann P. Appl. Phys. Lett. 88 (2006) 031906