Electron-beam-induced deposition of carbonaceous micro structures using scanning electron microscopy

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 269-273

  Miura, Naruhisa ^a   Ishii, Hideaki ^a   Shirakashi, Jun Ichi ^b   Yamada, Akira ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

Atomic force microscopy; Carbonaceous microstructures; Electron beam induced deposition; MIM diode

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRON BEAMS; HYDROCARBONS; MIM DEVICES; MOLECULES; SCANNING ELECTRON MICROSCOPY;

CARBONACEOUS MICROSTRUCTURE; ELECTRON BEAM INDUCED DEPOSITION;

CRYSTAL MICROSTRUCTURE;

EID: 0031547256     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00767-2     Document Type: Article

References (14)

1. K. Matsumoto, S. Takahashi, M. Ishii, M. Hoshi, A. Kurokawa, S. Ochimura and A. Ando, Jpn. J. Appl. Phys. 34 (1995) 1387.
2. K. Matsumoto, M. Ishii, J. Shirakashi, K. Segawa, Y. Oka, B.J. Vartanian and J.S. Harris, Tech. Dig. Int. Electron Device Meet. (1995) 363.
3. J. Shirakashi, M. Ishii, K. Matsumoto, N. Miura and M. Konagai, Abstr. 54th Device Research Conf. (DRC) (1996).
4. N. Kramer, H. Birk, J. Jorritsma and C. Schonenberger, Appl. Phys. Lett. 66 (1995) 1325.
5. M.J. Vasile, D. Grigg, J.E. Griffith, E. Fitzgerald and P.E. Russell, J. Vac. Sci. Technol. B 9 (1991) 3569.
6. J.S. Hub, M.I. Shepard and J. Melngailis, J. Vac. Sci. Technol. B 9 (1991) 173.
7. Y. Gotoh, T. Ohtake, N. Fujita, K. Inoue, H. Tsuji and J. Ishikawa, J. Vac. Sci. Technol. B 13 (1995) 465.
8. A.N. Broers, W.W. Molzen, J.J. Cuomo and N.D. Wittels, Appl. Phys. Lett. 29 (1976) 596.
9. N. Miura, H. Ishii, A. Yamada and M. Konagai, Jpn. J. Appl. Phys., submitted.
10. K.I. Schiffmann, Nanotechnology 4 (1993) 163.
11. Y. Akama, E. Nishimura, A. Sakai and H. Murakami, J. Vac. Sci. Technol. A 8 (1990) 429.
12. K.L. Lee, D.W. Abraham, F. Secord and L. Landstein, J. Vac. Sci. Technol. B 9 (1991) 3562.
13. M. Ramsteiner, J. Wagner, Ch. Wild and P. Koidl, J. Appl. Phys. 62 (1987) 729.
14. M. Yoshikawa, G. Katagiri, H. Ishida, A. Ishitani and T. Akamatsu, J. Appl. Phys. 64 (1988) 6464.