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Applied Surface Science

Volumn 242, Issue 1-2, 2005, Pages 107-113

Auger electron spectroscopy analysis of high metal content micro-structures grown by electron beam induced deposition

(6) Cicoira, F a Hoffmann, P a Olsson, C O A b Xanthopoulos, N b Mathieu, H J b Doppelt, P c

a EPFL (Switzerland)

b Laboratory of Mechanical Metallurgy Ecole Polytechnique Federale de Lausanne (Switzerland)

c CNRS (France)

Author keywords

Auger electron spectroscopy; Chemical vapor deposition; Nanomaterials

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DECOMPOSITION; ELECTRON BEAMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON IRRADIATION; GROWTH (MATERIALS); IONIZATION; MASS SPECTROMETRY; NANOSTRUCTURED MATERIALS; PROBABILITY DENSITY FUNCTION; RHODIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

DENSITY FUNCTIONAL THEORY (DFT); ELECTRON BEAM INDUCED DEPOSITION (EBID); ELECTRON ENERGY; ELECTRON IONIZATION;

MICROSTRUCTURE;

EID: 11844266514 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2004.08.005 Document Type: Article

Times cited : (16)

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