Study of temperature influence on electron beam induced deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 3, 2006, Pages 431-436

  Li, Wei ^a   Joy, David C ^a,b  

^a University of Tennessee Knoxville   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM INDUCED DEPOSITION (EBID); ELECTRON STIMULATED DESORPTION MECHANISM; TEMPERATURE DEPENDENCE;

DESORPTION; THERMAL EFFECTS; TUNGSTEN; TUNGSTEN COMPOUNDS;

ELECTRON BEAMS;

EID: 33646542395     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2187995     Document Type: Article

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