SCOPUS 정보 검색 플랫폼

Materials Science and Engineering R: Reports

Volumn 88, Issue , 2015, Pages 1-41

High-K materials and metal gates for CMOS applications

(2) Robertson, John a Wallace, Robert M b

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b The University of Texas at Dallas (United States)

Author keywords

CMOS; Field effect transistor; Gate oxide; HfO2; High K oxide

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTAL ATOMIC STRUCTURE; ELECTRODES; ELECTRONIC STRUCTURE; FIELD EFFECT TRANSISTORS; GATE DIELECTRICS; HAFNIUM OXIDES; HIGH-K DIELECTRIC; LEAKAGE CURRENTS; LOW-K DIELECTRIC; METALLURGY; METALS; MOS DEVICES; OXIDE SEMICONDUCTORS; POLYCRYSTALLINE MATERIALS; REFRACTORY METAL COMPOUNDS; SCAVENGING; SILICA; SILICON OXIDES; THRESHOLD VOLTAGE;

CMOS TRANSISTOR STRUCTURES; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; CONDUCTION MECHANISM; GATE OXIDE; HFO2; HIGH-K OXIDES; METAL GATE ELECTRODES; SILICON DIOXIDE LAYERS;

GERMANIUM;

EID: 84916604634 PISSN: 0927796X EISSN: None Source Type: Journal
DOI: 10.1016/j.mser.2014.11.001 Document Type: Review

Times cited : (590)

References (405)

1
- 35348909664
- M.T. Bohr, R.S. Chau, T. Ghani, K. Mistry, IEEE Spectrum. 44 (29) (2007).
- (2007) IEEE Spectrum. , vol.44 , pp. 29
- Bohr, M.T.¹ Chau, R.S.² Ghani, T.³ Mistry, K.⁴

2
- 0035872897
- G. Wilk, R.M. Wallace, J.M.J. Anthony, Appl. Phys. 89 (5243) (2001).
- (2001) Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.¹ Wallace, R.M.² Anthony, J.M.J.³

3
- 0034739021
- A.I. Kingon, A.I. Kingon, J.P. Maria, S.K. Streiffer, Nature 406 (1032) (2000).
- (2000) Nature , vol.406 , pp. 1032
- Kingon, A.I.¹ Kingon, A.I.² Maria, J.P.³ Streiffer, S.K.⁴

4
- 84916621635
- March
- R.M. Wallace, G. Wilk (Eds.), MRS Bulletin, vol. 27, March 2002.
- (2002) MRS Bulletin , vol.27
- Wallace, R.M.¹ Wilk, G.²

5
- 10844282779
- J. Robertson, Euro Phys. J. Appl. Phys. 28 (265) (2004).
- (2004) Euro Phys. J. Appl. Phys. , vol.28 , pp. 265
- Robertson, J.¹

6
- 84916595377
- IOP, London
- M. Houssa, High K Gate oxides, IOP, London, 2003.
- (2003) High K Gate Oxides
- Houssa, M.¹

7
- 84916621634
- Kluwer, Amsterdam
- A.A. Demkov, A. Navrotsky, Gate Oxides, Kluwer, Amsterdam, 2004.
- (2004) Gate Oxides
- Demkov, A.A.¹ Navrotsky, A.²

8
- 84916621633
- Springer, Berlin
- H. Huff, D. Gilmer, Gate Oxides, Springer, Berlin, 2004.
- (2004) Gate Oxides
- Huff, H.¹ Gilmer, D.²

9
- 31044455312
- J. Robertson, Rep. Prog. Phys. 69 (327) (2006).
- (2006) Rep. Prog. Phys. , vol.69 , pp. 327
- Robertson, J.¹

10
- 33748614600
- E.P. Gusev, V. Narayanan, M.M. Frank, IBM J. Res. Dev. 50 (387) (2006).
- (2006) IBM J. Res. Dev. , vol.50 , pp. 387
- Gusev, E.P.¹ Narayanan, V.² Frank, M.M.³

11
- 85015540478
- M. Ieong, V. Narayanan, D. Singh, A. Topol, V. Chan, Z. Ren, Mater. Today 9 (June (26)) (2006).
- (2006) Mater. Today , vol.9 , Issue.JUNE 26
- Ieong, M.¹ Narayanan, V.² Singh, D.³ Topol, A.⁴ Chan, V.⁵ Ren, Z.⁶

12
- 85015537510
- B.H. Lee, J. Oh, H.H. Tseng, R. Jammy, H. Huff, Mater. Today 9 (June (32)) (2006).
- (2006) Mater. Today , vol.9 , Issue.JUNE 32
- Lee, B.H.¹ Oh, J.² Tseng, H.H.³ Jammy, R.⁴ Huff, H.⁵

13
- 37749026017
- B.H. Lee, S.C. Song, P. Kirsch, IEEE Trans. ED 55 (8) (2008).
- (2008) IEEE Trans. ED , vol.55 , pp. 8
- Lee, B.H.¹ Song, S.C.² Kirsch, P.³

14
- 0031140867
- S.H. Lo, D.A. Buchanan, Y. Taur, W. Wang, IEEE ED Lett. 18 (209) (1997).
- (1997) IEEE ED Lett. , vol.18 , pp. 209
- Lo, S.H.¹ Buchanan, D.A.² Taur, Y.³ Wang, W.⁴

15
- 85059207454
- K. Mistry, C. Allen, C. Auth, B. Beattie, D. Bergstrom, M. Bost, M. Buehler, A. Cappelani, R. Chau, C.H. Choi, G. Ding, K. Fischer, T. Ghani, R. Grover, W. Han, D. Hanken, M. Hattendorf, J. He, J. Hicks, D. Huessner, D. Ingerley, P. Jain, R. James, L. Jong, S. Joshi, C. Kenyon, K. Kuhn, K. Lee, H. Liy, B. McIntyre, P. Moon, J. Neiynck, C. Parker, D. Parsons, L. Pipes, M. Prince, P. Ranade, T. Reynolds, J. Sandford, L. Schifren, J. Sebastian, J. Seiple, D. Simon, S. Sivakumar, P. Smith, C. Thomas, T. Troeger, P. Vanderyoon, S. Williams, K. Zawadzi, IEEE IEDM Tech Digest, 2007, p. 10.2.
- (2007) IEEE IEDM Tech Digest , pp. 10.2
- Mistry, K.¹ Allen, C.² Auth, C.³ Beattie, B.⁴ Bergstrom, D.⁵ Bost, M.⁶ Buehler, M.⁷ Cappelani, A.⁸ Chau, R.⁹ Choi, C.H.¹⁰ Ding, G.¹¹ Fischer, K.¹² Ghani, T.¹³ Grover, R.¹⁴ Han, W.¹⁵ Hanken, D.¹⁶ Hattendorf, M.¹⁷ He, J.¹⁸ Hicks, J.¹⁹ Huessner, D.²⁰ more..

16
- 85015520171
- M. Chudzik, B. Doris, R. Mo, J. Sleight, E. Cartier, C. Dewan, D. Park, H. Bu, W. Natzle, W. Yan, M. Khae, T.C. Chen, IEEE Tech Digest VLSI, 2007, p. 194.
- (2007) IEEE Tech Digest VLSI , pp. 194
- Chudzik, M.¹ Doris, B.² Mo, R.³ Sleight, J.⁴ Cartier, E.⁵ Dewan, C.⁶ Park, D.⁷ Bu, H.⁸ Natzle, W.⁹ Yan, W.¹⁰ Khae, M.¹¹ Chen, T.C.¹²

17
- 12344330470
- E.P. Gusev, D.A. Buchanan, E. Cartier, A. Kumar, S. Guha, A. Callegari, S. Zafar, P.C. Jamison, D.A. Neumayer, M. Copel, M.A. Gribelyuk, H. Okorn-Schmidt, C. D'Emic, P. Kozlowski, K. Chan, N. Bojarczuk, L.A. Ragnarsson, P. Ronsheim, K. Rim, R.J. Fleming, A. Mocuta, A. Ajmera, Tech Digest IEDM, 2001, p. 455.
- (2001) Tech Digest IEDM , pp. 455
- Gusev, E.P.¹ Buchanan, D.A.² Cartier, E.³ Kumar, A.⁴ Guha, S.⁵ Callegari, A.⁶ Zafar, S.⁷ Jamison, P.C.⁸ Neumayer, D.A.⁹ Copel, M.¹⁰ Gribelyuk, M.A.¹¹ Okorn-Schmidt, H.¹² D'Emic, C.¹³ Kozlowski, P.¹⁴ Chan, K.¹⁵ Bojarczuk, N.¹⁶ Ragnarsson, L.A.¹⁷ Ronsheim, P.¹⁸ Rim, K.¹⁹ Fleming, R.J.²⁰ Mocuta, A.²¹ Ajmera, A.²² more..

18
- 0015650818
- J. Koomen, Solid-State Electron. 16 (801) (1973).
- (1973) Solid-State Electron. , vol.16 , pp. 801
- Koomen, J.¹

19
- 0020186076
- C.G. Sodini, T.W. Ekstedt, J.L. Moll, Solid-State Electron. 25 (833) (1982).
- (1982) Solid-State Electron. , vol.25 , pp. 833
- Sodini, C.G.¹ Ekstedt, T.W.² Moll, J.L.³

20
- 0034187380
- J. Robertson, J. Vac. Sci. Technol. B 18 (1785) (2000).
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 1785
- Robertson, J.¹

21
- 0030291621
- H.J. Hubbard, D.G. Schlom, J. Mater. Res. 11 (2757) (1996).
- (1996) J. Mater. Res. , vol.11 , pp. 2757
- Hubbard, H.J.¹ Schlom, D.G.²

22
- 0036502104
- D.G. Schlom, J.H. Haeni, MRS Bull. 27 (198) (2002).
- (2002) MRS Bull. , vol.27 , pp. 198
- Schlom, D.G.¹ Haeni, J.H.²

23
- 0000020022
- M. Copel, M. Gribelyuk, E. Gusev, Appl. Phys. Lett. 76 (436) (2000).
- (2000) Appl. Phys. Lett. , vol.76 , pp. 436
- Copel, M.¹ Gribelyuk, M.² Gusev, E.³

24
- 79955986464
- M. Gutowski, J.E. Jaffe, C.L. Liu, M. Stoker, R.I. Hegde, R.S. Rai, P.J. Tobin, Appl. Phys. Lett. 80 (1897) (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 1897
- Gutowski, M.¹ Jaffe, J.E.² Liu, C.L.³ Stoker, M.⁴ Hegde, R.I.⁵ Rai, R.S.⁶ Tobin, P.J.⁷

25
- 0034217328
- Y.H. Wu, M.Y. Yang, A. Chin, W.J. Chen, C.M. Kwei, IEEE ED Lett. 21 (341) (2000).
- (2000) IEEE ED Lett. , vol.21 , pp. 341
- Wu, Y.H.¹ Yang, M.Y.² Chin, A.³ Chen, W.J.⁴ Kwei, C.M.⁵

26
- 85015519248
- (a) H. Iwai, et al., IEEE Tech Digest IEDM, 2002;
- (2002) IEEE Tech Digest IEDM
- Iwai, H.¹

27
- 85015541038
- (b) M.K.J. Okamoto, H. Iwai, Proc. ESSDERC (2007) 199.
- Proc. ESSDERC (2007) , vol.199
- Okamoto, M.K.J.¹ Iwai, H.²

28
- 0001705774
- J. Kwo, et al. Appl. Phys. Lett. 77 (2000) 130.
- (2000) Appl. Phys. Lett. , vol.77 , pp. 130
- Kwo, J.¹

29
- 0141719634
- A. Fissel, H.J. Osten, E. Bugiel, J. Vac. Sci. Technol. B 21 (2003) 1765.
- (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 1765
- Fissel, A.¹ Osten, H.J.² Bugiel, E.³

30
- 0346534582
- G.D. Wilk, R. Wallace, J.M. Anthony, J. Appl. Phys. 87 (2000) 484.
- (2000) J. Appl. Phys. , vol.87 , pp. 484
- Wilk, G.D.¹ Wallace, R.² Anthony, J.M.³

31
- 0041592503
- J.-F. Damlencourt, et al. Solid-State Electron. 47 (2003) 1613.
- (2003) Solid-State Electron. , vol.47 , pp. 1613
- Damlencourt, J.-F.¹

32
- 33751099033
- G. Bersuker, et al. J. Appl. Phys. 100 (2006) 094108.
- (2006) J. Appl. Phys. , vol.100 , pp. 094108
- Bersuker, G.¹

33
- 33746835689
- M.P. Agustin, G. Bersuker, B. Foran, L.A. Boatner, S. Stemmer, J. Appl. Phys. 100 (2006) 024103.
- (2006) J. Appl. Phys. , vol.100 , pp. 024103
- Agustin, M.P.¹ Bersuker, G.² Foran, B.³ Boatner, L.A.⁴ Stemmer, S.⁵

34
- 33646894371
- A. Deshpande, R. Inman, G. Jurisch, C.G. Takoudis, J. Appl. Phys. 99 (2006) 094102.
- (2006) J. Appl. Phys. , vol.99 , pp. 094102
- Deshpande, A.¹ Inman, R.² Jurisch, G.³ Takoudis, C.G.⁴

35
- 33847128767
- C. Maunoury, et al. J. Appl. Phys. 101 (2007) 034112.
- (2007) J. Appl. Phys. , vol.101 , pp. 034112
- Maunoury, C.¹

36
- 28344457990
- M.T. Ho, R.T. Brewer, L.S. Wiehlunski, Y.J. Chabal, N. Moumen, M. Boleslawski, Appl. Phys. Lett. 87 (2005) 133103.
- (2005) Appl. Phys. Lett. , vol.87 , pp. 133103
- Ho, M.T.¹ Brewer, R.T.² Wiehlunski, L.S.³ Chabal, Y.J.⁴ Moumen, N.⁵ Boleslawski, M.⁶

37
- 85015518406
- P.E. Batson, Microsc. Microanal. 11 (Suppl. 2) (2005) 2164.
- (2005) Microsc. Microanal. , vol.11 , pp. 2164
- Batson, P.E.¹

38
- 33947637868
- D. Schmeisser, F. Zheng, F.J. Himpsel, H.J. Engelmann, E. Zschech, MRS Symp. Proc. 917 (2006) E10-E12.
- (2006) MRS Symp. Proc. , vol.917 , pp. E10-E12
- Schmeisser, D.¹ Zheng, F.² Himpsel, F.J.³ Engelmann, H.J.⁴ Zschech, E.⁵

39
- 84871887849
- P.-G. Mani-Gonzalez, M.-O. Vazquez-Lepe, F. Espinosa-Magaña, A. Herrera-Gomez, J. Vac. Sci. Technol. A 31 (2013) 010601.
- (2013) J. Vac. Sci. Technol. A , vol.31 , pp. 010601
- Mani-Gonzalez, P.-G.¹ Vazquez-Lepe, M.-O.² Espinosa-Magaña, F.³ Herrera-Gomez, A.⁴

40
- 0001561168
- J. Robertson, C.W. Chen, Appl. Phys. Lett. 74 (1999) 1168.
- (1999) Appl. Phys. Lett. , vol.74 , pp. 1168
- Robertson, J.¹ Chen, C.W.²

41
- 0242523727
- X. Zhang, A. Demkov, L. Hao, X. Hu, Y. Wei, J. Kulik, Phys. Rev. B 68 (2003) 125323.
- (2003) Phys. Rev. B , vol.68 , pp. 125323
- Zhang, X.¹ Demkov, A.² Hao, L.³ Hu, X.⁴ Wei, Y.⁵ Kulik, J.⁶

42
- 0035498635
- E.P. Gusev, E. Cartier, D.A. Buchanan, M. Gribelyuk, M. Copel, Microelectron. Eng. 59 (2001) 341.
- (2001) Microelectron. Eng. , vol.59 , pp. 341
- Gusev, E.P.¹ Cartier, E.² Buchanan, D.A.³ Gribelyuk, M.⁴ Copel, M.⁵

43
- 0035395260
- S. Guha, E. Cartier, N.A. Bojarczuk, J. Bruley, L. Gignac, J. Karasinski, Appl. Phys. Lett. 90 (2001) 512.
- (2001) Appl. Phys. Lett. , vol.90 , pp. 512
- Guha, S.¹ Cartier, E.² Bojarczuk, N.A.³ Bruley, J.⁴ Gignac, L.⁵ Karasinski, J.⁶

44
- 79955998808
- S. Guha, E.P. Gusev, H. Okorn-Schmidt, L.A. Ragnarsson, N.A. Bojarczuk, Appl. Phys. Lett. 81 (2002) 2956.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 2956
- Guha, S.¹ Gusev, E.P.² Okorn-Schmidt, H.³ Ragnarsson, L.A.⁴ Bojarczuk, N.A.⁵

45
- 85015518950
- W. Tsai, et al., IMEC Tech Digest IEDM paper 13.2, 2003.
- (2003) IMEC Tech Digest IEDM Paper 13.2
- Tsai, W.¹

46
- 79956033267
- Y.C. Yeo, T.J. King, C. Hu, Appl. Phys. Lett. 81 (2002) 2091.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 2091
- Yeo, Y.C.¹ King, T.J.² Hu, C.³

47
- 79956056584
- M.R. Visokay, J.J. Chambers, A.L.P. Rotondaro, A. Shanware, L. Colombo, Appl. Phys. Lett. 80 (2002) 3183.
- (2002) Appl. Phys. Lett. , vol.80 , pp. 3183
- Visokay, M.R.¹ Chambers, J.J.² Rotondaro, A.L.P.³ Shanware, A.⁴ Colombo, L.⁵

48
- 84916621625
- US Pat. 6020243 (2000); US Pat. Nos. 6291866; 6291866
- R.M. Wallace, R.A. Stoltz, G.D. Wilk, US Pat. Nos. 6013553; 6020243 (2000); US Pat. Nos. 6291866; 6291866 (2001).
- (2001)
- Wallace, R.M.¹ Stoltz, R.A.² Wilk, G.D.³

49
- 0000361018
- B.H. Lee, L. Kang, R. Nieh, W.J. Qi, J.C. Lee, Appl. Phys. Lett. 76 (2000) 1926.
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1926
- Lee, B.H.¹ Kang, L.² Nieh, R.³ Qi, W.J.⁴ Lee, J.C.⁵

50
- 4944257396
- H. Kim, P.C. McIntyre, C.O. Chui, K.C. Saraswat, S. Stemmer, J. Appl. Phys. 96 (2004) 3467.
- (2004) J. Appl. Phys. , vol.96 , pp. 3467
- Kim, H.¹ McIntyre, P.C.² Chui, C.O.³ Saraswat, K.C.⁴ Stemmer, S.⁵

51
- 79955983568
- (a) J. Morais, et al. Appl. Phys. Lett. 81 (2002) 2995;
- (2002) Appl. Phys. Lett. , vol.81 , pp. 2995
- Morais, J.¹

52
- 85015514955
- (b) J. Morais, et al. Appl. Phys. Lett. 79 (2001) 4192.
- (2001) Appl. Phys. Lett. , vol.79 , pp. 4192
- Morais, J.¹

53
- 79956058734
- M.A. Quevedo-Lopez, et al. Appl. Phys. Lett. 81 (2002) 1074.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 1074
- Quevedo-Lopez, M.A.¹

54
- 0037767886
- M.A. Quevedo-Lopez, et al. Appl. Phys. Lett. 82 (2003) 4669.
- (2003) Appl. Phys. Lett. , vol.82 , pp. 4669
- Quevedo-Lopez, M.A.¹

55
- 0037322229
- R.M.C. de Almeida, I.J.R. Baumvol, Surf. Sci. Rep. 49 (2003) 1.
- (2003) Surf. Sci. Rep. , vol.49 , pp. 1
- De Almeida, R.M.C.¹ Baumvol, I.J.R.²

56
- 0036501102
- March
- B.W. Busch, O. Pluchery, Y.J. Chabal, D.A. Muller, R. Opila, D.A. Muller, J.R. Kwo, E. Garfunkel, Mater. Res. Soc. Bull. (March 2002) 206.
- (2002) Mater. Res. Soc. Bull. , pp. 206
- Busch, B.W.¹ Pluchery, O.² Chabal, Y.J.³ Muller, D.A.⁴ Opila, R.⁵ Muller, D.A.⁶ Kwo, J.R.⁷ Garfunkel, E.⁸

57
- 3142749109
- S. Ferrari, G. Scarel, J. Appl. Phys. 96 (2004) 144.
- (2004) J. Appl. Phys. , vol.96 , pp. 144
- Ferrari, S.¹ Scarel, G.²

58
- 3343006353
- F.J. Himpsel, F.R. McFeely, A. Taleb-Ibrahami, J.A. Yarnoff, G. Hollinger, Phys. Rev. B 38 (1988) 6084.
- (1988) Phys. Rev. B , vol.38 , pp. 6084
- Himpsel, F.J.¹ McFeely, F.R.² Taleb-Ibrahami, A.³ Yarnoff, J.A.⁴ Hollinger, G.⁵

59
- 3843115732
- J.W. Keister, et al. J. Vac. Sci. Technol. B 17 (1999) 1250.
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 1250
- Keister, J.W.¹

60
- 0020935730
- E.H. Poindexter, P.J. Caplan, Prog. Surf. Sci. 14 (1983) 201.
- (1983) Prog. Surf. Sci. , vol.14 , pp. 201
- Poindexter, E.H.¹ Caplan, P.J.²

61
- 0037826992
- R.E. Mikawa, P.M. Lenahan, J. Appl. Phys. 59 (1986) 2054.
- (1986) J. Appl. Phys. , vol.59 , pp. 2054
- Mikawa, R.E.¹ Lenahan, P.M.²

62
- 0542363921
- (a) A. Stesmans, Appl. Phys. Lett. 68 (1996) 2723;
- (1996) Appl. Phys. Lett. , vol.68 , pp. 2723
- Stesmans, A.¹

63
- 11544321991
- (b) A. Stesmans, Appl. Phys. Lett. 68 (1996) 2076.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 2076
- Stesmans, A.¹

64
- 0000119442
- A. Stesmans, V.V. Afanasev, Phys. Rev. B 57 (1998) 10030.
- (1998) Phys. Rev. B , vol.57 , pp. 10030
- Stesmans, A.¹ Afanasev, V.V.²

65
- 85015507201
- C. Hobbs, et al. VLSI Symp. (2003) 9.
- VLSI Symp. (2003) , pp. 9
- Hobbs, C.¹

66
- 0141792795
- D.C. Gilmer, et al. Microelectron. Eng. 69 (2003) 138.
- (2003) Microelectron. Eng. , vol.69 , pp. 138
- Gilmer, D.C.¹

67
- 2942689784
- (a) C. Hobbs, et al. IEEE Trans. ED 51 (2004) 971;
- (2004) IEEE Trans. ED , vol.51 , pp. 971
- Hobbs, C.¹

68
- 2942657401
- (b) C. Hobbs, et al. IEEE Trans. ED 51 (2004) 978.
- (2004) IEEE Trans. ED , vol.51 , pp. 978
- Hobbs, C.¹

69
- 19944370832
- R. Chau, J. Brask, S. Datta, G. Dewey, M. Doczy, B. Doyle, J. Kavalieros, M. Radosavljevic, Microelectron. Eng. 80 (2005) 1.
- (2005) Microelectron. Eng. , vol.80 , pp. 1
- Chau, R.¹ Brask, J.² Datta, S.³ Dewey, G.⁴ Doczy, M.⁵ Doyle, B.⁶ Kavalieros, J.⁷ Radosavljevic, M.⁸

70
- 19744383491
- K. Xiong, P.W. Peacock, J. Robertson, Appl. Phys. Lett. 86 (2005) 012904.
- (2005) Appl. Phys. Lett. , vol.86 , pp. 012904
- Xiong, K.¹ Peacock, P.W.² Robertson, J.³

71
- 85015511095
- M.M. Frank, Proc ESSDERC, 2011.
- Proc ESSDERC, 2011
- Frank, M.M.¹

72
- 0003401328
- Wiley-Interscience
- J.E. Mahan, Physical Vapor Deposition of Thin Films, Wiley-Interscience, 2000.
- (2000) Physical Vapor Deposition of Thin Films
- Mahan, J.E.¹

73
- 0003494870
- Academic Press
- J.L. Vossen, W. Kern, Thin Film Processes, Academic Press, 1978 (1991).
- (1991) Thin Film Processes , vol.1978
- Vossen, J.L.¹ Kern, W.²

74
- 0026202438
- J.P. Lehan, T. Mao, B.G. Bovard, H.A. Macleod, Thin Solid Films 203 (1991) 227.
- (1991) Thin Solid Films , vol.203 , pp. 227
- Lehan, J.P.¹ Mao, T.² Bovard, B.G.³ Macleod, H.A.⁴

75
- 79956041216
- H. Harris, K. Choi, N. Mehta, A. Chandolu, N. Biswas, G. Kipshidze, S. Nikishin, S. Gangopadhyay, H. Temkin, Appl. Phys. Lett. 81 (2002) 1065.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 1065
- Harris, H.¹ Choi, K.² Mehta, N.³ Chandolu, A.⁴ Biswas, N.⁵ Kipshidze, G.⁶ Nikishin, S.⁷ Gangopadhyay, S.⁸ Temkin, H.⁹

76
- 3242880931
- K. Choi, H. Temkin, H. Harris, S. Gangopadhyay, L. Xie, M. White, Appl. Phys. Lett. 85 (2004) 215.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 215
- Choi, K.¹ Temkin, H.² Harris, H.³ Gangopadhyay, S.⁴ Xie, L.⁵ White, M.⁶

77
- 3042715207
- M. Houssa (Ed.), Inst Physics, Bristol, UK
- M. Ritala, in: M. Houssa (Ed.), High K Gate Dielectrics, Inst Physics, Bristol, UK, 2004.
- (2004) High K Gate Dielectrics
- Ritala, M.¹

78
- 0034646723
- M. Ritala, K. Kukli, A. Rahtu, P.I. Raisanen, M. Leskela, Science 288 (2000) 319.
- (2000) Science , vol.288 , pp. 319
- Ritala, M.¹ Kukli, K.² Rahtu, A.³ Raisanen, P.I.⁴ Leskela, M.⁵

79
- 75649140552
- S.M. George, Chem. Rev. 110 (2010) 111.
- (2010) Chem. Rev. , vol.110 , pp. 111
- George, S.M.¹

80
- 0037459393
- A.C. Jones, P.R. Chalker, J. Phys. D 36 (2003) R80.
- (2003) J. Phys. D , vol.36 , pp. R80
- Jones, A.C.¹ Chalker, P.R.²

81
- 0037115685
- M.L. Green, M.Y. Ho, B. Busch, G.D. Wilk, T. Sorsch, T. Conard, B. Brijs, W. Vandervorst, P.I. Raisanen, D.A. Muller, M. Bude, J. Grazul, J. Appl. Phys. 92 (2002) 7168.
- (2002) J. Appl. Phys. , vol.92 , pp. 7168
- Green, M.L.¹ Ho, M.Y.² Busch, B.³ Wilk, G.D.⁴ Sorsch, T.⁵ Conard, T.⁶ Brijs, B.⁷ Vandervorst, W.⁸ Raisanen, P.I.⁹ Muller, D.A.¹⁰ Bude, M.¹¹ Grazul, J.¹²

82
- 0242578070
- L.A. Ragnarrson, N.A. Bojarczuk, J. Karaninski, S. Guha, IEEE ED Lett. 24 (2003) 689.
- (2003) IEEE ED Lett. , vol.24 , pp. 689
- Ragnarrson, L.A.¹ Bojarczuk, N.A.² Karaninski, J.³ Guha, S.⁴

83
- 0038444633
- M.M. Frank, Y.J. Chabal, G.D. Wilk, Appl. Phys. Lett. 82 (2003) 4758.
- (2003) Appl. Phys. Lett. , vol.82 , pp. 4758
- Frank, M.M.¹ Chabal, Y.J.² Wilk, G.D.³

84
- 0043014767
- M.M. Frank, Y.J. Chabal, M.L. Green, A. Delabie, B. Brijs, G.D. Wilk, M.Y. Ho, I.J.R. Baumvol, Appl. Phys. Lett. 83 (2003) 740.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 740
- Frank, M.M.¹ Chabal, Y.J.² Green, M.L.³ Delabie, A.⁴ Brijs, B.⁵ Wilk, G.D.⁶ Ho, M.Y.⁷ Baumvol, I.J.R.⁸

85
- 0036799255
- D.M. Hausmann, E. Kim, J. Becker, R.G. Gordon, Chem. Mater. 14 (2002) 4350.
- (2002) Chem. Mater. , vol.14 , pp. 4350
- Hausmann, D.M.¹ Kim, E.² Becker, J.³ Gordon, R.G.⁴

86
- 0037298039
- D.M. Hausmann, R.G. Gordon, J. Cryst. Growth 249 (2003) 251.
- (2003) J. Cryst. Growth , vol.249 , pp. 251
- Hausmann, D.M.¹ Gordon, R.G.²

87
- 4444261663
- (a) J.S. Becker, E. Kim, R.G. Gordon, Chem. Mater. 16 (2004) 3497;
- (2004) Chem. Mater. , vol.16 , pp. 3497
- Becker, J.S.¹ Kim, E.² Gordon, R.G.³

88
- 0242583886
- (b) B.S. Lim, A. Rahtu, R.G. Gordon, Nat. Mater. 2 (2003) 749.
- (2003) Nat. Mater. , vol.2 , pp. 749
- Lim, B.S.¹ Rahtu, A.² Gordon, R.G.³

89
- 84885615020
- (a) T.Q. Ngo, A. Posadas, M.D. McDaniel, D.A. Ferrer, J. Bruley, C. Breslin, A.A. DEmkov, J.G. Ekerdt, J. Cryst. Growth 363 (2013) 150;
- (2013) J. Cryst. Growth , vol.363 , pp. 150
- Ngo, T.Q.¹ Posadas, A.² McDaniel, M.D.³ Ferrer, D.A.⁴ Bruley, J.⁵ Breslin, C.⁶ DEmkov, A.A.⁷ Ekerdt, J.G.⁸

90
- 84873628657
- (b) X. Wang, L. Dong, J. Zhang, Y. Liu, P.D. Ye, R.G. Gordon, Nanoletts 13 (2013) 594.
- (2013) Nanoletts , vol.13 , pp. 594
- Wang, X.¹ Dong, L.² Zhang, J.³ Liu, Y.⁴ Ye, P.D.⁵ Gordon, R.G.⁶

91
- 0141458069
- G.B. Rayner, D. Kang, G. Lucovsky, J. Vac. Sci. Technol. B 21 (2003) 1783.
- (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 1783
- Rayner, G.B.¹ Kang, D.² Lucovsky, G.³

92
- 0035477585
- J.P. Maria, D. Wicaksana, A.I. Kingon, B. Busch, H. Schulte, E. Garfunkel, T. Gustafsson, J. Appl. Phys. 90 (2001) 3476.
- (2001) J. Appl. Phys. , vol.90 , pp. 3476
- Maria, J.P.¹ Wicaksana, D.² Kingon, A.I.³ Busch, B.⁴ Schulte, H.⁵ Garfunkel, E.⁶ Gustafsson, T.⁷

93
- 0242335951
- S. Stemmer, Y. Li, B. Foran, P.S. Lysaght, S.K. Streiffer, P. Fuoss, S. Seifert, Appl. Phys. Lett. 83 (2003) 3141.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 3141
- Stemmer, S.¹ Li, Y.² Foran, B.³ Lysaght, P.S.⁴ Streiffer, S.K.⁵ Fuoss, P.⁶ Seifert, S.⁷

94
- 18744381306
- H. Kim, P.C. McIntyre, J. Appl. Phys. 92 (2002) 5094.
- (2002) J. Appl. Phys. , vol.92 , pp. 5094
- Kim, H.¹ McIntyre, P.C.²

95
- 0041379612
- S. Stemmer, Z. Chen, C.G. Levi, P.S. Lysaght, B. Foran, J.A. Gisby, J.R. Taylor, Jpn. J. Appl. Phys. 42 (2003) 3593.
- (2003) Jpn. J. Appl. Phys. , vol.42 , pp. 3593
- Stemmer, S.¹ Chen, Z.² Levi, C.G.³ Lysaght, P.S.⁴ Foran, B.⁵ Gisby, J.A.⁶ Taylor, J.R.⁷

96
- 0036567778
- C. Zhao, O. Richard, E. Young, H. Bender, G. Roebben, S. Haukka, S. DeGendt, M. Houssa, R. Carter, W. Tsai, O. Van der Biest, M. Heyns, J. Non-Cryst. Solids 303 (2002) 144.
- (2002) J. Non-Cryst. Solids , vol.303 , pp. 144
- Zhao, C.¹ Richard, O.² Young, E.³ Bender, H.⁴ Roebben, G.⁵ Haukka, S.⁶ DeGendt, S.⁷ Houssa, M.⁸ Carter, R.⁹ Tsai, W.¹⁰ Van Der Biest, O.¹¹ Heyns, M.¹²

97
- 2342632548
- S. Stemmer, J. Vac. Sci. Technol. B 22 (2004) 791.
- (2004) J. Vac. Sci. Technol. B , vol.22 , pp. 791
- Stemmer, S.¹

98
- 0037175936
- V. Naraynan, S. Guha, M. Copel, N.A. Bojarczuk, P.L. Flaitz, M. Bribelyuk, Appl. Phys. Lett. 81 (2002) 4183.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 4183
- Naraynan, V.¹ Guha, S.² Copel, M.³ Bojarczuk, N.A.⁴ Flaitz, P.L.⁵ Bribelyuk, M.⁶

99
- 85015524140
- (a) T. Ando, et al., Tech Digest IEDM, 2009;
- (2009) Tech Digest IEDM
- Ando, T.¹

100
- 85015513369
- (b) T. Ando, et al., Tech Digest IEDM, 2011.
- (2011) Tech Digest IEDM
- Ando, T.¹

101
- 84874886496
- T. Ando, Materials 5 (2012) 478.
- (2012) Materials , vol.5 , pp. 478
- Ando, T.¹

102
- 77950491947
- T. Ando, M. Copel, J. Bruley, M.M. Frank, H. Watanabe, V. Narayanan, Appl. Phys. Lett. 96 (2010) 132904.
- (2010) Appl. Phys. Lett. , vol.96 , pp. 132904
- Ando, T.¹ Copel, M.² Bruley, J.³ Frank, M.M.⁴ Watanabe, H.⁵ Narayanan, V.⁶

103
- 84880521455
- M.M. Frank, E.A. Cartier, T. Ando, S.W. Bedell, J. Bruley, Y. Zhu, V. Narayanan, E.C.S. Solid Lett. 2 (2013) N8.
- (2013) E.C.S. Solid Lett. , vol.2 , pp. N8
- Frank, M.M.¹ Cartier, E.A.² Ando, T.³ Bedell, S.W.⁴ Bruley, J.⁵ Zhu, Y.⁶ Narayanan, V.⁷

104
- 85059207371
- T. Ando, B. Kannan, U. Kwon, W.L. Lai, B.P. Linder, E.A. Cartier, R. Haight, M. Copel, S.A. JBruly, V. Krishnan, Narayanan Tech Digest VLSI Technol., 2014, p. 6.1.
- (2014) Narayanan Tech Digest VLSI Technol. , pp. 6.1
- Ando, T.¹ Kannan, B.² Kwon, U.³ Lai, W.L.⁴ Linder, B.P.⁵ Cartier, E.A.⁶ Haight, R.⁷ Copel, M.⁸ JBruly, S.A.⁹ Krishnan, V.¹⁰

105
- 0035848123
- M. Copel, E. Cartier, F.M. Ross, Appl. Phys. Lett. 78 (2001) 1607.
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1607
- Copel, M.¹ Cartier, E.² Ross, F.M.³

106
- 0037175909
- M. Copel, E. Cartier, V. Narayanan, M.C. Reuter, S. Guha, N. Bojarczuk, Appl. Phys. Lett. 81 (2002) 4227.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 4227
- Copel, M.¹ Cartier, E.² Narayanan, V.³ Reuter, M.C.⁴ Guha, S.⁵ Bojarczuk, N.⁶

107
- 4944257396
- H.S. Kim, P.C. McIntyre, C.O. Cui, K.C. Saraswat, S. Stemmer, J. Appl. Phys. 96 (2004) 3467.
- (2004) J. Appl. Phys. , vol.96 , pp. 3467
- Kim, H.S.¹ McIntyre, P.C.² Cui, C.O.³ Saraswat, K.C.⁴ Stemmer, S.⁵

108
- 4043156243
- H. Watanabe, M. Saitoh, N. Ikarashi, T. Tatsumi, Appl. Phys. Lett. 85 (2004) 449.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 449
- Watanabe, H.¹ Saitoh, M.² Ikarashi, N.³ Tatsumi, T.⁴

109
- 31544477427
- H. Shimizu, K. Kita, K. Kyuno, A. Toriumi, Jpn. J. Appl. Phys. 44 (2005) 6131.
- (2005) Jpn. J. Appl. Phys. , vol.44 , pp. 6131
- Shimizu, H.¹ Kita, K.² Kyuno, K.³ Toriumi, A.⁴

110
- 18744406968
- P.W. Peacock, J. Robertson, J. Appl. Phys. 92 (2002) 4712.
- (2002) J. Appl. Phys. , vol.92 , pp. 4712
- Peacock, P.W.¹ Robertson, J.²

111
- 79958164289
- J.H. Choi, Y. Mao, J.P. Chang, Mater. Sci. Eng. R 72 (2011) 97.
- (2011) Mater. Sci. Eng. R , vol.72 , pp. 97
- Choi, J.H.¹ Mao, Y.² Chang, J.P.³

112
- 0025400035
- R.H. French, J. Am. Ceram. Soc. 73 (1990) 477.
- (1990) J. Am. Ceram. Soc. , vol.73 , pp. 477
- French, R.H.¹

113
- 0031548428
- P. Lamparter, R. Kniep, Phys. B 234 (1997) 405.
- (1997) Phys. B , vol.234 , pp. 405
- Lamparter, P.¹ Kniep, R.²

114
- 33644516912
- H. Momida, T. Hamada, Y. Takagi, T. Yamamoto, T. Uda, T. Ohno, Phys. Rev. B 73 (2006) 054108.
- (2006) Phys. Rev. B , vol.73 , pp. 054108
- Momida, H.¹ Hamada, T.² Takagi, Y.³ Yamamoto, T.⁴ Uda, T.⁵ Ohno, T.⁶

115
- 38849161056
- V.V. Afanaev, A. Stesmans, J. Appl. Phys. 102 (2007) 081301.
- (2007) J. Appl. Phys. , vol.102 , pp. 081301
- Afanaev, V.V.¹ Stesmans, A.²

116
- 59349115581
- D. Liu, J. Robertson, Appl. Phys. Lett. 94 (2009) 042904.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 042904
- Liu, D.¹ Robertson, J.²

117
- 0001307437
- R.H. French, S.J. Glass, F.S. Ohuchi, Y.N. Xu, W.Y. Ching, Phys. Rev. B 49 (1994) 5133.
- (1994) Phys. Rev. B , vol.49 , pp. 5133
- French, R.H.¹ Glass, S.J.² Ohuchi, F.S.³ Xu, Y.N.⁴ Ching, W.Y.⁵

118
- 37249033698
- J.E. Medvedeva, A.J. Freeman, C.B. Geller, D.M. Rishel, Phys. Rev. B 76 (2007) 235115.
- (2007) Phys. Rev. B , vol.76 , pp. 235115
- Medvedeva, J.E.¹ Freeman, A.J.² Geller, C.B.³ Rishel, D.M.⁴

119
- 84865662642
- H.S. Lee, S.J. Clark, J. Robertson, Phys. Rev. B 86 (2012) 075209.
- (2012) Phys. Rev. B , vol.86 , pp. 075209
- Lee, H.S.¹ Clark, S.J.² Robertson, J.³

120
- 1642603066
- G. Lucovsky, Y. Zhang, J.L. Whitten, D.G. Schlom, J.L. Freeouf, Microelectron. Eng. 72 (2004) 288.
- (2004) Microelectron. Eng. , vol.72 , pp. 288
- Lucovsky, G.¹ Zhang, Y.² Whitten, J.L.³ Schlom, D.G.⁴ Freeouf, J.L.⁵

121
- 0034906475
- G.M. Rignanese, X. Gonze, A. Pasquarello, Phys. Rev. B 63 (2001) 104305.
- (2001) Phys. Rev. B , vol.63 , pp. 104305
- Rignanese, G.M.¹ Gonze, X.² Pasquarello, A.³

122
- 33847760293
- K. Xiong, Y. Du, K. Tse, J. Robertson, J. Appl. Phys. 101 (2007) 024101.
- (2007) J. Appl. Phys. , vol.101 , pp. 024101
- Xiong, K.¹ Du, Y.² Tse, K.³ Robertson, J.⁴

123
- 33847212058
- P. Broqvist, A. Pasquarello, Appl. Phys. Lett. 90 (2007) 082907.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 082907
- Broqvist, P.¹ Pasquarello, A.²

124
- 20844445585
- J. Morais, L. Miotti, K.P. Bastos, S.R. Teixeira, I.J.R. Baumvol, A.L.P. Rotondaro, J.J. Chambers, M.R. Visokay, L. Colombo, M.C. MartinsAlves, Appl. Phys. Lett. 86 (2005) 212906.
- (2005) Appl. Phys. Lett. , vol.86 , pp. 212906
- Morais, J.¹ Miotti, L.² Bastos, K.P.³ Teixeira, S.R.⁴ Baumvol, I.J.R.⁵ Rotondaro, A.L.P.⁶ Chambers, J.J.⁷ Visokay, M.R.⁸ Colombo, L.⁹ MartinsAlves, M.C.¹⁰

125
- 33846450287
- C.A. Pignedoli, A. Curioni, W. Andreoni, Phys. Rev. Lett. 98 (2007) 037602.
- (2007) Phys. Rev. Lett. , vol.98 , pp. 037602
- Pignedoli, C.A.¹ Curioni, A.² Andreoni, W.³

126
- 0037100765
- H. Kato, T. Nango, T. Miyagawa, T. Katagiri, K.S. Seol, Y. Ohki, J. Appl. Phys. 92 (2002) 1106.
- (2002) J. Appl. Phys. , vol.92 , pp. 1106
- Kato, H.¹ Nango, T.² Miyagawa, T.³ Katagiri, T.⁴ Seol, K.S.⁵ Ohki, Y.⁶

127
- 33746062052
- K. Xiong, J. Robertson, S.J. Clark, Appl. Phys. Lett. 89 (2006) 022907.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 022907
- Xiong, K.¹ Robertson, J.² Clark, S.J.³

128
- 0036537434
- S.G. Lim, S. Kriventsov, T.N. Jackson, J.H. Haeni, D.G. Schlom, A.M. Balbashov, R. Uecker, P. Reiche, J.L. Freeouf, G. Lucovsky, J. Appl. Phys. 91 (2002) 4500.
- (2002) J. Appl. Phys. , vol.91 , pp. 4500
- Lim, S.G.¹ Kriventsov, S.² Jackson, T.N.³ Haeni, J.H.⁴ Schlom, D.G.⁵ Balbashov, A.M.⁶ Uecker, R.⁷ Reiche, P.⁸ Freeouf, J.L.⁹ Lucovsky, G.¹⁰

129
- 84916621620
- November
- D.G. Schlom, S. Datta, S. Guha, MRS Bull. (2008 November).
- (2008) MRS Bull.
- Schlom, D.G.¹ Datta, S.² Guha, S.³

130
- 36649029963
- M. Sousa, C. Rossel, C. Marchiori, H. Siegwart, D. Caimi, J.P. Locquet, D.J. Webb, R. Germann, J. Fompeyrine, K. Babich, J.W. Seo, C. Diker, J. Appl. Phys. 102 (2007) 104103.
- (2007) J. Appl. Phys. , vol.102 , pp. 104103
- Sousa, M.¹ Rossel, C.² Marchiori, C.³ Siegwart, H.⁴ Caimi, D.⁵ Locquet, J.P.⁶ Webb, D.J.⁷ Germann, R.⁸ Fompeyrine, J.⁹ Babich, K.¹⁰ Seo, J.W.¹¹ Diker, C.¹²

131
- 27344443406
- K. Xiong, J. Robertson, M.C. Gibson, S.J. Clark, Appl. Phys. Lett. 87 (2005) 183505.
- (2005) Appl. Phys. Lett. , vol.87 , pp. 183505
- Xiong, K.¹ Robertson, J.² Gibson, M.C.³ Clark, S.J.⁴

132
- 33746414309
- J. Robertson, K. Xiong, S.J. Clark, Phys. Status Solidi B 243 (2006) 2054.
- (2006) Phys. Status Solidi B , vol.243 , pp. 2054
- Robertson, J.¹ Xiong, K.² Clark, S.J.³

133
- 51149124316
- A. Alkauskas, P. Broqvist, F. Devynck, A. Pasquarello, Phys. Rev. Lett. 101 (2008) 106802.
- (2008) Phys. Rev. Lett. , vol.101 , pp. 106802
- Alkauskas, A.¹ Broqvist, P.² Devynck, F.³ Pasquarello, A.⁴

134
- 85015519523
- P. Broqvist, A. Pasquarello, Appl. Phys. Lett. 89 (2006) 082908.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 082908
- Broqvist, P.¹ Pasquarello, A.²

135
- 0042950395
- B. Kralik, E.K. Chang, S.G. Louie, Phys. Rev. B 57 (1998) 7027.
- (1998) Phys. Rev. B , vol.57 , pp. 7027
- Kralik, B.¹ Chang, E.K.² Louie, S.G.³

136
- 0035391117
- J. Drabowski, V. Zavodinsky, A. Fleszar, Microelectron. Reliab. 41 (2001) 1093.
- (2001) Microelectron. Reliab. , vol.41 , pp. 1093
- Drabowski, J.¹ Zavodinsky, V.² Fleszar, A.³

137
- 0037096520
- X. Zhao, D. Vanderbilt, Phys. Rev. B 65 (2002) 233106.
- (2002) Phys. Rev. B , vol.65 , pp. 233106
- Zhao, X.¹ Vanderbilt, D.²

138
- 37649026786
- G.M. Rignanese, X. Gionze, G. Jun, K.J. Cho, A. Pasquarello, Phys. Rev. B 69 (2004) 184301.
- (2004) Phys. Rev. B , vol.69 , pp. 184301
- Rignanese, G.M.¹ Gionze, X.² Jun, G.³ Cho, K.J.⁴ Pasquarello, A.⁵

139
- 28644431816
- P. Delugas, V. Fiorentini, A. Filippetti, Phys. Rev. B 71 (2005) 134302.
- (2005) Phys. Rev. B , vol.71 , pp. 134302
- Delugas, P.¹ Fiorentini, V.² Filippetti, A.³

140
- 85015531593
- J. Robertson, J. Appl. Phys. 104 (2008) 123111.
- (2008) J. Appl. Phys. , vol.104 , pp. 123111
- Robertson, J.¹

141
- 36449003275
- R.D. Shannon, J. Appl. Phys. 73 (1993) 348.
- (1993) J. Appl. Phys. , vol.73 , pp. 348
- Shannon, R.D.¹

142
- 85015539011
- R. Hegde, et al., Tech Digest IEDM, 2005, p. 59.
- (2005) Tech Digest IEDM , pp. 59
- Hegde, R.¹

143
- 34247249900
- R.I. Hegde, D.H. Triyoso, S.B. Samavedam, B.E. White, J. Appl. Phys. 101 (2007) 074113.
- (2007) J. Appl. Phys. , vol.101 , pp. 074113
- Hegde, R.I.¹ Triyoso, D.H.² Samavedam, S.B.³ White, B.E.⁴

144
- 34249904900
- D.H. Triyoso, R.I. Hegde, J.K. Schaeffer, J. Vac. Sci. Technol. B 25 (2007) 845.
- (2007) J. Vac. Sci. Technol. B , vol.25 , pp. 845
- Triyoso, D.H.¹ Hegde, R.I.² Schaeffer, J.K.³

145
- 33749476389
- K. Tomida, K. Kita, A. Toriumi, Appl. Phys. Lett. 89 (2006) 142902.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 142902
- Tomida, K.¹ Kita, K.² Toriumi, A.³

146
- 68249143053
- D. Tsoutsou, G. Apostopoulos, S.F. Galata, P. Tsipas, A. Sotiropoulos, G. Mavrou, Y. Panayiotatos, A. Dimoulas, A. Lagoyannis, A.G. Karydas, V. Kantarelou, S. Harrissopoulos, J. Appl. Phys. 106 (2009) 024107.
- (2009) J. Appl. Phys. , vol.106 , pp. 024107
- Tsoutsou, D.¹ Apostopoulos, G.² Galata, S.F.³ Tsipas, P.⁴ Sotiropoulos, A.⁵ Mavrou, G.⁶ Panayiotatos, Y.⁷ Dimoulas, A.⁸ Lagoyannis, A.⁹ Karydas, A.G.¹⁰ Kantarelou, V.¹¹ Harrissopoulos, S.¹²

147
- 0000476216
- P. Li, I.W. Chen, J.E. Penner-Hahn, J. Am. Ceram. Soc. 77 (1991) 118.
- (1991) J. Am. Ceram. Soc. , vol.77 , pp. 118
- Li, P.¹ Chen, I.W.² Penner-Hahn, J.E.³

148
- 0000213153
- J.P. Goff, W. Hayes, S. Hull, M.T. Hutchings, K.N. Clausen, Phys. Rev. B 59 (1999) 14202.
- (1999) Phys. Rev. B , vol.59 , pp. 14202
- Goff, J.P.¹ Hayes, W.² Hull, S.³ Hutchings, M.T.⁴ Clausen, K.N.⁵

149
- 0000273760
- G. Stapper, M. Bernasconi, N. Nicoloso, M. Parrinello, Phys. Rev. B 59 (1999) 797.
- (1999) Phys. Rev. B , vol.59 , pp. 797
- Stapper, G.¹ Bernasconi, M.² Nicoloso, N.³ Parrinello, M.⁴

150
- 38049010868
- D. Fischer, A. Kersch, Appl. Phys. Lett. 92 (2008) 012908.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 012908
- Fischer, D.¹ Kersch, A.²

151
- 56049098674
- C.K. Lee, E. Cho, H.S. Lee, C.S. Hwang, S. Han, Phys. Rev. B 78 (2008) 012102.
- (2008) Phys. Rev. B , vol.78 , pp. 012102
- Lee, C.K.¹ Cho, E.² Lee, H.S.³ Hwang, C.S.⁴ Han, S.⁵

152
- 1242308912
- L.F. Edge, D.G. Schlom, S.A. Chambers, E. Cicerrella, J.L. Freeouf, B. Hollander, J. Schubert, Appl. Phys. Lett. 84 (2004) 726.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 726
- Edge, L.F.¹ Schlom, D.G.² Chambers, S.A.³ Cicerrella, E.⁴ Freeouf, J.L.⁵ Hollander, B.⁶ Schubert, J.⁷

153
- 33645149343
- L.F. Edge, D.G. Schlom, P. Sivasubramani, R.M. Wallace, B. Hollander, J. Schubert, Appl. Phys. Lett. 88 (2006) 112907.
- (2006) Appl. Phys. Lett. , vol.88 , pp. 112907
- Edge, L.F.¹ Schlom, D.G.² Sivasubramani, P.³ Wallace, R.M.⁴ Hollander, B.⁵ Schubert, J.⁶

154
- 33751561573
- J.M.J. Lopes, M. Roekerath, T. Heeg, E. Rije, J. Schubert, S. Mantl, V.V. Afanasev, S. Shamuilia, A. Stesmans, Y. Jia, D.G. Schlom, Appl. Phys. Lett. 89 (2006) 222902.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 222902
- Lopes, J.M.J.¹ Roekerath, M.² Heeg, T.³ Rije, E.⁴ Schubert, J.⁵ Mantl, S.⁶ Afanasev, V.V.⁷ Shamuilia, S.⁸ Stesmans, A.⁹ Jia, Y.¹⁰ Schlom, D.G.¹¹

155
- 34248634613
- J.M.J. Lopes, M. Roekerath, T. Heeg, U. Littmark, J. Schubert, S. Mantl, Y. Jia, D.G. Schlom, Microelectron. Eng. 84 (2007) 1890.
- (2007) Microelectron. Eng. , vol.84 , pp. 1890
- Lopes, J.M.J.¹ Roekerath, M.² Heeg, T.³ Littmark, U.⁴ Schubert, J.⁵ Mantl, S.⁶ Jia, Y.⁷ Schlom, D.G.⁸

156
- 37549044714
- J. Schubert, O. Trithaveesak, W. Zander, D.G. Schlom, Appl. Phys. A 90 (2008) 577.
- (2008) Appl. Phys. A , vol.90 , pp. 577
- Schubert, J.¹ Trithaveesak, O.² Zander, W.³ Schlom, D.G.⁴

157
- 33646430900
- M. Wagner, et al. Appl. Phys. Lett. 88 (2006) 172901.
- (2006) Appl. Phys. Lett. , vol.88 , pp. 172901
- Wagner, M.¹

158
- 33845384913
- R. Thomas, et al. Appl. Phys. Lett. 89 (2006) 232902.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 232902
- Thomas, R.¹

159
- 33947326574
- A. Laha, H.J. Osten, A. Fissel, Appl. Phys. Lett. 90 (2007) 113508.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 113508
- Laha, A.¹ Osten, H.J.² Fissel, A.³

160
- 51849128695
- E.D. Ozban, J. Lopes, M. Roeckerath, D.G. Schlom, J. Schubert, S. Mantl, Appl. Phys. Lett. 93 (2008) 052902.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 052902
- Ozban, E.D.¹ Lopes, J.² Roeckerath, M.³ Schlom, D.G.⁴ Schubert, J.⁵ Mantl, S.⁶

161
- 67650735821
- K. Xiong, J. Robertson, Appl. Phys. Lett. 95 (2009) 022903.
- (2009) Appl. Phys. Lett. , vol.95 , pp. 022903
- Xiong, K.¹ Robertson, J.²

162
- 18144384439
- S.A. Shevlin, A. Curioni, W. Andreoni, Phys. Rev. Lett. 94 (2005) 146401.
- (2005) Phys. Rev. Lett. , vol.94 , pp. 146401
- Shevlin, S.A.¹ Curioni, A.² Andreoni, W.³

163
- 18144423189
- E. Bonera, G. Scarel, M. Fanciulli, P. Delugas, V. Fiorentini, Phys. Rev. Lett. 94 (2005) 027602.
- (2005) Phys. Rev. Lett. , vol.94 , pp. 027602
- Bonera, E.¹ Scarel, G.² Fanciulli, M.³ Delugas, P.⁴ Fiorentini, V.⁵

164
- 24844473951
- A. Baldereschi, A. Baroni, R. Resta, Phys. Rev. Lett. 61 (1988) 734.
- (1988) Phys. Rev. Lett. , vol.61 , pp. 734
- Baldereschi, A.¹ Baroni, A.² Resta, R.³

165
- 33750668607
- C.G. van de Walle, Phys. Rev. B 39 (1989) 1871.
- (1989) Phys. Rev. B , vol.39 , pp. 1871
- Van De Walle, C.G.¹

166
- 0342955088
- (a) R.T. Tung, Phys. Rev. Lett. 84 (2000) 6078;
- (2000) Phys. Rev. Lett. , vol.84 , pp. 6078
- Tung, R.T.¹

167
- 0035890648
- (b) R.T. Tung, Phys. Rev. B 64 (2001) 205310.
- (2001) Phys. Rev. B , vol.64 , pp. 205310
- Tung, R.T.¹

168
- 5844355552
- W. Mönch, Phys. Rev. Lett. 58 (1987) 1260.
- (1987) Phys. Rev. Lett. , vol.58 , pp. 1260
- Mönch, W.¹

169
- 0028320643
- W. Mönch, Surf. Sci. 300 (1994) 928.
- (1994) Surf. Sci. , vol.300 , pp. 928
- Mönch, W.¹

170
- 0001597428
- J. Tersoff, Phys. Rev. Lett. 52 (1984) 465.
- (1984) Phys. Rev. Lett. , vol.52 , pp. 465
- Tersoff, J.¹

171
- 36849123485
- A.W. Cowley, S.M. Sze, J. Appl. Phys. 36 (1965) 3212.
- (1965) J. Appl. Phys. , vol.36 , pp. 3212
- Cowley, A.W.¹ Sze, S.M.²

172
- 85015534265
- (a) J. Robertson, Tech Digest IEDM, 2009;
- (2009) Tech Digest IEDM
- Robertson, J.¹

173
- 65249129755
- (b) J. Robertson, Appl. Phys. Lett. 94 (2009) 152104.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 152104
- Robertson, J.¹

174
- 84885163521
- J. Robertson, J. Vac. Sci. Technol. A 31 (2013) 050821.
- (2013) J. Vac. Sci. Technol. A , vol.31 , pp. 050821
- Robertson, J.¹

175
- 0001094129
- S.A. Chambers, Y. Liang, Z. Yu, R. Dropad, J. Ramdani, K. Eisenbeiser, Appl. Phys. Lett. 77 (2000) 1662.
- (2000) Appl. Phys. Lett. , vol.77 , pp. 1662
- Chambers, S.A.¹ Liang, Y.² Yu, Z.³ Dropad, R.⁴ Ramdani, J.⁵ Eisenbeiser, K.⁶

176
- 0000632737
- R. Ludeke, M.T. Cuberes, E. Cartier, Appl. Phys. Lett. 76 (2000) 2886.
- (2000) Appl. Phys. Lett. , vol.76 , pp. 2886
- Ludeke, R.¹ Cuberes, M.T.² Cartier, E.³

177
- 0016330698
- D.J. Maria, J. Appl. Phys. 45 (1974) 5454.
- (1974) J. Appl. Phys. , vol.45 , pp. 5454
- Maria, D.J.¹

178
- 0035858356
- V.V. Afanasev, M. Houssa, A. Stesmans, M.M. Heyns, Appl. Phys. Lett. 78 (2001) 3073.
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3073
- Afanasev, V.V.¹ Houssa, M.² Stesmans, A.³ Heyns, M.M.⁴

179
- 33845392078
- V.V. Afanasev, M. Houssa, A. Stesmans, M.M. Heyns, J. Appl. Phys. 91 (2002) 3079.
- (2002) J. Appl. Phys. , vol.91 , pp. 3079
- Afanasev, V.V.¹ Houssa, M.² Stesmans, A.³ Heyns, M.M.⁴

180
- 79956051787
- V.V. Afanasev, A. Stesmans, F. Chen, X. Shi, S.A. Cambell, Appl. Phys. Lett. 81 (2002) 1053.
- (2002) Appl. Phys. Lett. , vol.81 , pp. 1053
- Afanasev, V.V.¹ Stesmans, A.² Chen, F.³ Shi, X.⁴ Cambell, S.A.⁵

181
- 4043136447
- V.V. Afanesev, A. Stesmans, M. Passlack, N. Medendrop, Appl. Phys. Lett. 85 (2004) 597.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 597
- Afanesev, V.V.¹ Stesmans, A.² Passlack, M.³ Medendrop, N.⁴

182
- 79956054375
- S. Sayan, E. Garfunkel, S. Suzer, Appl. Phys. Lett. 80 (2002) 2135.
- (2002) Appl. Phys. Lett. , vol.80 , pp. 2135
- Sayan, S.¹ Garfunkel, E.² Suzer, S.³

183
- 0035982614
- G.B. Rayner, D. Kang, Y. Zhang, G. Lucovsky, J. Vac. Sci. Technol. B 20 (2002) 1748.
- (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 1748
- Rayner, G.B.¹ Kang, D.² Zhang, Y.³ Lucovsky, G.⁴

184
- 0142026383
- S. Oshima, T. Toyoda, J. Okumura, H. Okabayashi, Kumigashira, Appl. Phys. Lett. 83 (2003) 2172.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 2172
- Oshima, S.¹ Toyoda, T.² Okumura, J.³ Okabayashi, H.⁴ Kumigashira⁵

185
- 4544299449
- O. Reynault, N.T. Barrett, D. Samour, S. Quiais-Marthon, Surf. Sci. 566 (2004) 526.
- (2004) Surf. Sci. , vol.566 , pp. 526
- Reynault, O.¹ Barrett, N.T.² Samour, D.³ Quiais-Marthon, S.⁴

186
- 4944219625
- C.C. Fulton, R.J. Nemanich, J. Appl. Phys. 96 (2004) 2665.
- (2004) J. Appl. Phys. , vol.96 , pp. 2665
- Fulton, C.C.¹ Nemanich, R.J.²

187
- 12144287611
- T. Hattori, T. Yosihda, T. Shiraishi, K. Takahashi, H. Nohira, S. Joumori, K. Nakajima, M. Suzuki, K. Kimura, I. Kashiwagi, C. Ohshima, S. Ohmi, H. Iwai, Microelectron. Eng. 72 (2004) 283.
- (2004) Microelectron. Eng. , vol.72 , pp. 283
- Hattori, T.¹ Yosihda, T.² Shiraishi, T.³ Takahashi, K.⁴ Nohira, H.⁵ Joumori, S.⁶ Nakajima, K.⁷ Suzuki, M.⁸ Kimura, K.⁹ Kashiwagi, I.¹⁰ Ohshima, C.¹¹ Ohmi, S.¹² Iwai, H.¹³

188
- 0035519201
- S. Miyazaki, J. Vac. Sci. Technol. B 19 (2001) 2212.
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 2212
- Miyazaki, S.¹

189
- 11044239234
- G. Seguini, E. Bonera, S. Spiga, G. Scarel, M. Fanciulli, Appl. Phys. Lett. 85 (2004) 5316.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 5316
- Seguini, G.¹ Bonera, E.² Spiga, S.³ Scarel, G.⁴ Fanciulli, M.⁵

190
- 33748262438
- V.V. Afanasev, A. Stesmans, D. Droopad, Appl. Phys. Lett. 89 (2006) 092103.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 092103
- Afanasev, V.V.¹ Stesmans, A.² Droopad, D.³

191
- 1642603312
- A. Ohta, M. Yamaoka, S. Miyazaki, Microelectron. Eng. 72 (2004) 154.
- (2004) Microelectron. Eng. , vol.72 , pp. 154
- Ohta, A.¹ Yamaoka, M.² Miyazaki, S.³

192
- 22644448699
- J.W. Keister, et al. J. Vac. Sci. Technol. B 17 (1999) 1831.
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 1831
- Keister, J.W.¹

193
- 0009417325
- J.L. Alay, M. Hirose, J. Appl. Phys. 81 (1997) 1606.
- (1997) J. Appl. Phys. , vol.81 , pp. 1606
- Alay, J.L.¹ Hirose, M.²

194
- 33746281113
- J. Robertson, B. Falabretti, J. Appl. Phys. 100 (2006) 014111.
- (2006) J. Appl. Phys. , vol.100 , pp. 014111
- Robertson, J.¹ Falabretti, B.²

195
- 57049102907
- V.V. Afanasev, M. Badylevich, A. Stesmans, Appl. Phys. Lett. 93 (2008) 212104.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 212104
- Afanasev, V.V.¹ Badylevich, M.² Stesmans, A.³

196
- 4243672394
- V. Fiorentini, G. Gulleri, Phys. Rev. Lett. 89 (2002) 266101.
- (2002) Phys. Rev. Lett. , vol.89 , pp. 266101
- Fiorentini, V.¹ Gulleri, G.²

197
- 0036606978
- A. Fissel, J. Dabrowski, H.J. Osten, J. Appl. Phys. 91 (2002) 8986.
- (2002) J. Appl. Phys. , vol.91 , pp. 8986
- Fissel, A.¹ Dabrowski, J.² Osten, H.J.³

198
- 1642330111
- P.W. Peacock, J. Robertson, Phys. Rev. Lett. 92 (2004) 057601.
- (2004) Phys. Rev. Lett. , vol.92 , pp. 057601
- Peacock, P.W.¹ Robertson, J.²

199
- 33644520929
- P.W. Peacock, K. Xiong, K. Tse, J. Robertson, Phys. Rev. B 73 (2006) 075328.
- (2006) Phys. Rev. B , vol.73 , pp. 075328
- Peacock, P.W.¹ Xiong, K.² Tse, K.³ Robertson, J.⁴

200
- 4644242777
- C.J. Forst, C. Ashman, K. Schwarz, P.E. Blochl, Nature 427 (2004) 56.
- (2004) Nature , vol.427 , pp. 56
- Forst, C.J.¹ Ashman, C.² Schwarz, K.³ Blochl, P.E.⁴

201
- 79956006409
- S.J. Wang, C.K. Ong, Appl. Phys. Lett. 80 (2002) 2541.
- (2002) Appl. Phys. Lett. , vol.80 , pp. 2541
- Wang, S.J.¹ Ong, C.K.²

202
- 33749233440
- Y.F. Dong, Y.P. Feng, S.J. Wang, A.C.H. Huan, Phys. Rev. B 72 (2005) 045327.
- (2005) Phys. Rev. B , vol.72 , pp. 045327
- Dong, Y.F.¹ Feng, Y.P.² Wang, S.J.³ Huan, A.C.H.⁴

203
- 17644420336
- Y.F. Dong, S.J. Wang, J.W. Chai, Y.P. Feng, A.C.H. Huan, Appl. Phys. Lett. 86 (2005) 132103.
- (2005) Appl. Phys. Lett. , vol.86 , pp. 132103
- Dong, Y.F.¹ Wang, S.J.² Chai, J.W.³ Feng, Y.P.⁴ Huan, A.C.H.⁵

204
- 33144485586
- Y.F. Dong, S.J. Wang, Y.P. Feng, A.C.H. Huan, Phys. Rev. B 73 (2006) 045302.
- (2006) Phys. Rev. B , vol.73 , pp. 045302
- Dong, Y.F.¹ Wang, S.J.² Feng, Y.P.³ Huan, A.C.H.⁴

205
- 42749100720
- R. Puthenkovilakam, E.A. Carter, J.P. Chang, Phys. Rev. B 69 (2004) 155329.
- (2004) Phys. Rev. B , vol.69 , pp. 155329
- Puthenkovilakam, R.¹ Carter, E.A.² Chang, J.P.³

206
- 19944375819
- J. Garavin, L. Fonseca, G. Bersuker, A.L. Shluger, Microelectron. Eng. 80 (2005) 412.
- (2005) Microelectron. Eng. , vol.80 , pp. 412
- Garavin, J.¹ Fonseca, L.² Bersuker, G.³ Shluger, A.L.⁴

207
- 34248995628
- P. Broqvist, A. Pasquarello, Microelectron. Eng. 84 (2007) 2022.
- (2007) Microelectron. Eng. , vol.84 , pp. 2022
- Broqvist, P.¹ Pasquarello, A.²

208
- 12344337788
- J. Robertson, Solid State Electron. 49 (2005) 283.
- (2005) Solid State Electron. , vol.49 , pp. 283
- Robertson, J.¹

209
- 0035627760
- A.S. Foster, V.B. Sulimov, F.L. Gejo, A.L. Shluger, R.N. Nieminen, Phys. Rev. B 64 (2001) 224108.
- (2001) Phys. Rev. B , vol.64 , pp. 224108
- Foster, A.S.¹ Sulimov, V.B.² Gejo, F.L.³ Shluger, A.L.⁴ Nieminen, R.N.⁵

210
- 0036573608
- A.S. Foster, F.L. Gejo, A.L. Shluger, R.N. Nieminen, Phys. Rev. B 65 (2002) 174117.
- (2002) Phys. Rev. B , vol.65 , pp. 174117
- Foster, A.S.¹ Gejo, F.L.² Shluger, A.L.³ Nieminen, R.N.⁴

211
- 84861906827
- K. Xiong, J.J. Robertson, Appl. Phys. 99 (2006) 044105.
- (2006) Appl. Phys. , vol.99 , pp. 044105
- Xiong, K.¹ Robertson, J.J.²

212
- 19944409920
- K. Torii, K. Shirashi, S. Miyazaki, K. Yamabe, M. Boero, T. Chikyow, K. Yamada, H. Kitajima, T. Arikado, Tech Digest IEDM, 2004, p. 129.
- (2004) Tech Digest IEDM , pp. 129
- Torii, K.¹ Shirashi, K.² Miyazaki, S.³ Yamabe, K.⁴ Boero, M.⁵ Chikyow, T.⁶ Yamada, K.⁷ Kitajima, H.⁸ Arikado, T.⁹

213
- 2942609580
- J. Kang, E.C. Lee, K.J. Chang, Y.G. Jin, Appl. Phys. Lett. 84 (2004) 3894.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 3894
- Kang, J.¹ Lee, E.C.² Chang, K.J.³ Jin, Y.G.⁴

214
- 1642588409
- W.L. Scopel, A.J.R. da Silva, W. Orellana, A. Fazzio, Appl. Phys. Lett. 84 (2004) 1492.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 1492
- Scopel, W.L.¹ Da Silva, A.J.R.² Orellana, W.³ Fazzio, A.⁴

215
- 23944468042
- Y.P. Feng, A.T.L. Lim, M.F. Li, Appl. Phys. Lett. 87 (2005) 062105.
- (2005) Appl. Phys. Lett. , vol.87 , pp. 062105
- Feng, Y.P.¹ Lim, A.T.L.² Li, M.F.³

216
- 79958061020
- M. Ikeda, et al. Mater. Res. Soc. Symp. Proc. 786 (2004) E5.4.
- (2004) Mater. Res. Soc. Symp. Proc. , vol.786 , pp. E5.4
- Ikeda, M.¹

217
- 35248860269
- D.M. Ramo, A.L. Shluger, J.L. Gavartin, Phys. Rev. Lett. 99 (2007) 155504.
- (2007) Phys. Rev. Lett. , vol.99 , pp. 155504
- Ramo, D.M.¹ Shluger, A.L.² Gavartin, J.L.³

218
- 70449638190
- J.X. Zheng, G. Ceder, W.K. Chim, Phys. Status Solidi RRL 2 (2008) 227.
- (2008) Phys. Status Solidi RRL , vol.2 , pp. 227
- Zheng, J.X.¹ Ceder, G.² Chim, W.K.³

219
- 77955359929
- C. Tang, R. Ramprasad, PRB 81 (2010) 161201.
- (2010) PRB , vol.81 , pp. 161201
- Tang, C.¹ Ramprasad, R.²

220
- 33747855477
- J.L. Gavartin, D.M. Ramo, A.L. Shluger, G. Bersuker, Appl. Phys. Lett. 89 (2006) 082908.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 082908
- Gavartin, J.L.¹ Ramo, D.M.² Shluger, A.L.³ Bersuker, G.⁴

221
- 63749093037
- E.A. Choi, K.J. Chang, Appl. Phys. Lett. 94 (2009) 122901.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 122901
- Choi, E.A.¹ Chang, K.J.²

222
- 79958072349
- J.L. Lyons, A. Janotti, C.G. Van de Walle, Microelecron. Eng. 88 (2011) 1452.
- (2011) Microelecron. Eng. , vol.88 , pp. 1452
- Lyons, J.L.¹ Janotti, A.² Van De Walle, C.G.³

223
- 79961081502
- J. Robertson, S.J. Clark, Phys. Rev. B 83 (2011) 075205.
- (2011) Phys. Rev. B , vol.83 , pp. 075205
- Robertson, J.¹ Clark, S.J.²

224
- 0242496382
- A.Y. Kang, P.M. Lenahan, J.F. Conley, Appl. Phys. Lett. 83 (2003) 3407.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 3407
- Kang, A.Y.¹ Lenahan, P.M.² Conley, J.F.³

225
- 0346765511
- G. Bersuker, P. Zeitzoff, G. Brown, H.R. Huff, Mater. Today 7 (January) (2004) 26.
- (2004) Mater. Today , vol.7 , Issue.JANUARY , pp. 26
- Bersuker, G.¹ Zeitzoff, P.² Brown, G.³ Huff, H.R.⁴

226
- 0038650830
- S. Zafar, A. Callegari, E. Gusev, M.V. Fischetti, J. Appl. Phys. 93 (2003) 9298.
- (2003) J. Appl. Phys. , vol.93 , pp. 9298
- Zafar, S.¹ Callegari, A.² Gusev, E.³ Fischetti, M.V.⁴

227
- 0037718399
- A. Kerber, E. Cartier, L. Pantisano, R. Degraeve, T. Kauerauf, Y. Kim, G. Groeseneken, H.E. Maes, U. Schwalke, IEEE ED Lett. 24 (2003) 87.
- (2003) IEEE ED Lett. , vol.24 , pp. 87
- Kerber, A.¹ Cartier, E.² Pantisano, L.³ Degraeve, R.⁴ Kauerauf, T.⁵ Kim, Y.⁶ Groeseneken, G.⁷ Maes, H.E.⁸ Schwalke, U.⁹

228
- 19944365221
- J. Mitard, C. Leroux, G. Ghibaudo, G. Reimbold, X. Garros, B. Guillaumot, F. Boulanger, Microelectron. Eng. 80 (2005) 362.
- (2005) Microelectron. Eng. , vol.80 , pp. 362
- Mitard, J.¹ Leroux, C.² Ghibaudo, G.³ Reimbold, G.⁴ Garros, X.⁵ Guillaumot, B.⁶ Boulanger, F.⁷

229
- 85015537713
- E.A. Cartier, B.P. Linder, V. Narayanan, V.K. Paruchuri, Tech Digest IEDM, 2006.
- (2006) Tech Digest IEDM
- Cartier, E.A.¹ Linder, B.P.² Narayanan, V.³ Paruchuri, V.K.⁴

230
- 0942266947
- W. He, T.P. Ma, Appl. Phys. Lett. 83 (2003) 5461.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 5461
- He, W.¹ Ma, T.P.²

231
- 0942299243
- E.P. Gusev, C.P. D'Emic, Appl. Phys. Lett. 83 (2003) 5223.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 5223
- Gusev, E.P.¹ D'Emic, C.P.²

232
- 4344620031
- H. Takeuchi, D. Ha, T.J. King, J. Vac. Sci. Technol. A 22 (2004) 1337.
- (2004) J. Vac. Sci. Technol. A , vol.22 , pp. 1337
- Takeuchi, H.¹ Ha, D.² King, T.J.³

233
- 27644547745
- N.V. Nguyen, A.V. Davydov, D.M. Chandler-Horowitz, M.M. Frank, Appl. Phys. Lett. 87 (2005) 192903.
- (2005) Appl. Phys. Lett. , vol.87 , pp. 192903
- Nguyen, N.V.¹ Davydov, A.V.² Chandler-Horowitz, D.M.³ Frank, M.M.⁴

234
- 33846983891
- S.A. Walsh, L. Fang, J.K. Schaffer, E. Weisbrod, L.J. Brillson, Appl. Phys. Lett. 90 (2007) 052901.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 052901
- Walsh, S.A.¹ Fang, L.² Schaffer, J.K.³ Weisbrod, E.⁴ Brillson, L.J.⁵

235
- 34547277537
- S. Guha, Phys. Rev. Lett. 98 (2007) 196101.
- (2007) Phys. Rev. Lett. , vol.98 , pp. 196101
- Guha, S.¹

236
- 38049035351
- S. Guha, P. Solomon, Appl. Phys. Lett. 92 (2008) 012909.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 012909
- Guha, S.¹ Solomon, P.²

237
- 77956213417
- C. Ko, M. Shandalov, P.C. McIntyre, S. Ramanathan, Appl. Phys. Lett. 97 (2010) 082102.
- (2010) Appl. Phys. Lett. , vol.97 , pp. 082102
- Ko, C.¹ Shandalov, M.² McIntyre, P.C.³ Ramanathan, S.⁴

238
- 79954594438
- S. Zafar, H. Jagannath, L.F. Edge, D. Gupta, Appl. Phys. Lett. 98 (2011) 152903.
- (2011) Appl. Phys. Lett. , vol.98 , pp. 152903
- Zafar, S.¹ Jagannath, H.² Edge, L.F.³ Gupta, D.⁴

239
- 79955990439
- A. Stesmans, V.V. Afanas'ev, Appl. Phys. Lett. 80 (2002) 1957.
- (2002) Appl. Phys. Lett. , vol.80 , pp. 1957
- Stesmans, A.¹ Afanas'Ev, V.V.²

240
- 0037828884
- A. Stesmans, V.V. Afanasev, Appl. Phys. Lett. 82 (2003) 4074.
- (2003) Appl. Phys. Lett. , vol.82 , pp. 4074
- Stesmans, A.¹ Afanasev, V.V.²

241
- 59949083713
- R.C. Barklie, S. Wright, J. Vac. Sci. Technol. B 27 (2009) 317.
- (2009) J. Vac. Sci. Technol. B , vol.27 , pp. 317
- Barklie, R.C.¹ Wright, S.²

242
- 84921700038
- R. Gillen, S.J. Clark, J. Robertson, Appl. Phys. Lett. (2012).
- (2012) Appl. Phys. Lett.
- Gillen, R.¹ Clark, S.J.² Robertson, J.³

243
- 0001498374
- M. Houssa, V.V. Afanasev, A. Stesmans, M.M. Heyns, Appl. Phys. Lett. 77 (2000) 1885.
- (2000) Appl. Phys. Lett. , vol.77 , pp. 1885
- Houssa, M.¹ Afanasev, V.V.² Stesmans, A.³ Heyns, M.M.⁴

244
- 0037421383
- H.S. Kim, P.C. McIntyre, K.C. Saraswat, Appl. Phys. Lett. 82 (2003) 106.
- (2003) Appl. Phys. Lett. , vol.82 , pp. 106
- Kim, H.S.¹ McIntyre, P.C.² Saraswat, K.C.³

245
- 20244386271
- N. Umezawa, K. Shiraishi, T. Ohno, H. Watanabe, T. Chikyow, K. Torii, K. Yamabe, K. Yamada, H. Kitajima, T. Arikado, Appl. Phys. Lett. 86 (2005) 143507.
- (2005) Appl. Phys. Lett. , vol.86 , pp. 143507
- Umezawa, N.¹ Shiraishi, K.² Ohno, T.³ Watanabe, H.⁴ Chikyow, T.⁵ Torii, K.⁶ Yamabe, K.⁷ Yamada, K.⁸ Kitajima, H.⁹ Arikado, T.¹⁰

246
- 20644443509
- J.L. Gavartin, A.L. Shluger, A.S. Foster, G.I. Bersuker, J. Appl. Phys. 97 (2005) 053704.
- (2005) J. Appl. Phys. , vol.97 , pp. 053704
- Gavartin, J.L.¹ Shluger, A.L.² Foster, A.S.³ Bersuker, G.I.⁴

247
- 0942299982
- N. Shang, P.W. Peacock, J. Robertson, Appl. Phys. Lett. 84 (2004) 106.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 106
- Shang, N.¹ Peacock, P.W.² Robertson, J.³

248
- 34848848075
- N. Umezawa, K. Shiraishi, Appl. Phys. Lett. 91 (2007) 132904.
- (2007) Appl. Phys. Lett. , vol.91 , pp. 132904
- Umezawa, N.¹ Shiraishi, K.²

249
- 85015536066
- H.H. Tseng, et al., IEDM, 2005.
- (2005) IEDM
- Tseng, H.H.¹

250
- 85015532502
- P. McIntyre, et al., IEDM, 2005.
- (2005) IEDM
- McIntyre, P.¹

251
- 33749489613
- (a) K. Tse, J. Robertson, Appl. Phys. Lett. 89 (2006) 142914;
- (2006) Appl. Phys. Lett. , vol.89 , pp. 142914
- Tse, K.¹ Robertson, J.²

252
- 33847634809
- (b) K. Tse, J. Robertson, Microelectron. Eng. 84 (2007) 663.
- (2007) Microelectron. Eng. , vol.84 , pp. 663
- Tse, K.¹ Robertson, J.²

253
- 84900837646
- H. Li, Y. Guo, J. Robertson, Appl. Phys. Lett. 104 (2014) 192904.
- (2014) Appl. Phys. Lett. , vol.104 , pp. 192904
- Li, H.¹ Guo, Y.² Robertson, J.³

254
- 79951815079
- (a) J.R. Weber, A. Janotti, C.G. van de Walle, J. Appl. Phys. 109 (2011) 033715;
- (2011) J. Appl. Phys. , vol.109 , pp. 033715
- Weber, J.R.¹ Janotti, A.² Van De Walle, C.G.³

255
- 84873681454
- (b) M. Choi, A. Janotti, C.G. Van de Walle, J. Appl. Phys. 113 (2013) 044501.
- (2013) J. Appl. Phys. , vol.113 , pp. 044501
- Choi, M.¹ Janotti, A.² Van De Walle, C.G.³

256
- 34548677301
- C.C. Yeh, T.P. Ma, N. Ramasawamy, N. Rocklein, D. Gealy, T. Graettinger, K. Min, Appl. Phys. Lett. 91 (2007) 113521.
- (2007) Appl. Phys. Lett. , vol.91 , pp. 113521
- Yeh, C.C.¹ Ma, T.P.² Ramasawamy, N.³ Rocklein, N.⁴ Gealy, D.⁵ Graettinger, T.⁶ Min, K.⁷

257
- 2442557837
- M. Specht, M. Stadele, S. Jakschik, U. Schroder, Appl. Phys. Lett. 84 (2004) 3076.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 3076
- Specht, M.¹ Stadele, M.² Jakschik, S.³ Schroder, U.⁴

258
- 85015507841
- R. DeGraeve, et al., Tech Digest IEDM, 2008, p. 353.
- (2008) Tech Digest IEDM , pp. 353
- DeGraeve, R.¹

259
- 85015509810
- X.F. Zheng, et al., Tech Digest, 2009, p. 139.
- (2009) Tech Digest , pp. 139
- Zheng, X.F.¹

260
- 33746062052
- K. Xiong, J. Robetson, S.J. Clark, Appl. Phys. Lett. 89 (2006) 022907.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 022907
- Xiong, K.¹ Robetson, J.² Clark, S.J.³

261
- 0017556846
- H.B. Michaelson, J. Appl. Phys. 48 (1977) 4729.
- (1977) J. Appl. Phys. , vol.48 , pp. 4729
- Michaelson, H.B.¹

262
- 0037115703
- Y.C. Yeo, T.J. King, C. Hu, J. Appl. Phys. 92 (2002) 7266.
- (2002) J. Appl. Phys. , vol.92 , pp. 7266
- Yeo, Y.C.¹ King, T.J.² Hu, C.³

263
- 21644474936
- M. Koyama, Y. Kamimuta, T. Ino, A. Kancko, S. Inumiya, K. Eguchi, M. Takayanagi, A. Nishiyama, Tech Digest IEDM, 2004, p. 499.
- (2004) Tech Digest IEDM , pp. 499
- Koyama, M.¹ Kamimuta, Y.² Ino, T.³ Kancko, A.⁴ Inumiya, S.⁵ Eguchi, K.⁶ Takayanagi, M.⁷ Nishiyama, A.⁸

264
- 85015527053
- S. Zafar, et al., IEEE Tech Digest VLSI Symp., 2005, p. 44.
- IEEE Tech Digest VLSI Symp., 2005 , pp. 44
- Zafar, S.¹

265
- 21644440911
- J.K. Schaeffer, C. Capasso, L. Fonseca, S. Samavedam, D. Gilmer, Y. Liang, O. Adetutu, C. Hobbs, E. Lckowski, R. Gregory, Z.X. Jiang, K. Moore, B.Y. Nguyen, D. Roan, B.E. White, P.J. Tobin, Tech Digest IEDM, 2004, p. 287.
- (2004) Tech Digest IEDM , pp. 287
- Schaeffer, J.K.¹ Capasso, C.² Fonseca, L.³ Samavedam, S.⁴ Gilmer, D.⁵ Liang, Y.⁶ Adetutu, O.⁷ Hobbs, C.⁸ Lckowski, E.⁹ Gregory, R.¹⁰ Jiang, Z.X.¹¹ Moore, K.¹² Nguyen, B.Y.¹³ Roan, D.¹⁴ White, B.E.¹⁵ Tobin, P.J.¹⁶

266
- 4944238315
- J.K. Schaeffer, L.R.C. Fonseca, S.B. Samavedam, Y. Liang, P.J. Tobin, B.E. White, Appl. Phys. Lett. 85 (2004) 1826.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 1826
- Schaeffer, J.K.¹ Fonseca, L.R.C.² Samavedam, S.B.³ Liang, Y.⁴ Tobin, P.J.⁵ White, B.E.⁶

267
- 85015539648
- E. Cartier, F.R. McFeely, V. Narayanan, P. Jamison, M. Copel, G. Shahidi, IEEE Tech Digest VLSI Symp, 2005, p. 15.
- IEEE Tech Digest VLSI Symp, 2005 , pp. 15
- Cartier, E.¹ McFeely, F.R.² Narayanan, V.³ Jamison, P.⁴ Copel, M.⁵ Shahidi, G.⁶

268
- 84916634718
- Presented at Spring
- P. Majhi, et al. Presented at Materials Research Society meeting, San Francisco, 2005, Spring.
- Materials Research Society Meeting, San Francisco, 2005
- Majhi, P.¹

269
- 36249014343
- H.C. Wen, P. Majhi, K. Choi, C.S. Park, H.N. Alshareef, H.R. Harris, H. Luan, H. Miimi, H.B. Park, G. Bersuker, P.S. Lysaght, D.L. Kwong, S.C. Song, B.H. Lee, R. Jammy, Microelectron. Eng. 85 (2008) 2.
- (2008) Microelectron. Eng. , vol.85 , pp. 2
- Wen, H.C.¹ Majhi, P.² Choi, K.³ Park, C.S.⁴ Alshareef, H.N.⁵ Harris, H.R.⁶ Luan, H.⁷ Miimi, H.⁸ Park, H.B.⁹ Bersuker, G.¹⁰ Lysaght, P.S.¹¹ Kwong, D.L.¹² Song, S.C.¹³ Lee, B.H.¹⁴ Jammy, R.¹⁵

270
- 2942700372
- (a) R. Jha, J. Gurganos, Y.H. Kim, R. Choi, J. Lee, V. Misra, IEEE ED Lett. 25 (2004) 420;
- (2004) IEEE ED Lett. , vol.25 , pp. 420
- Jha, R.¹ Gurganos, J.² Kim, Y.H.³ Choi, R.⁴ Lee, J.⁵ Misra, V.⁶

271
- 33745652739
- (b) H.C. Wen, et al. IEEE ED Lett. 27 (2006) 598.
- (2006) IEEE ED Lett. , vol.27 , pp. 598
- Wen, H.C.¹

272
- 33846100932
- H.H. Tseng, et al., Tech Digest IEDM, 2004, p. 821.
- (2004) Tech Digest IEDM , pp. 821
- Tseng, H.H.¹

273
- 33846274955
- J.K. Schaeffer, C. Capasso, R. Gregory, D. Gilmer, L.R.C. Fonseca, M. Raymond, C. Happ, M. Kottke, S.B. Samavedam, P.J. Tobin, B.E. White, J. Appl. Phys. 101 (2007) 014503.
- (2007) J. Appl. Phys. , vol.101 , pp. 014503
- Schaeffer, J.K.¹ Capasso, C.² Gregory, R.³ Gilmer, D.⁴ Fonseca, L.R.C.⁵ Raymond, M.⁶ Happ, C.⁷ Kottke, M.⁸ Samavedam, S.B.⁹ Tobin, P.J.¹⁰ White, B.E.¹¹

274
- 36448954531
- V. Narayanan, V.K. Paruchuri, N.A. Bojarczuk, B.P. Linder, B. Doris, Y.H. Kim, S. Zafar, J. Stathis, S. Brown, J. Arnold, M. Copel, E. Cartier, A. Callegari, S. Guha, G. Shahidi, T.C. Chen, IEEE Tech Digest VLSI Symp, 2006, p. 178.
- IEEE Tech Digest VLSI Symp, 2006 , pp. 178
- Narayanan, V.¹ Paruchuri, V.K.² Bojarczuk, N.A.³ Linder, B.P.⁴ Doris, B.⁵ Kim, Y.H.⁶ Zafar, S.⁷ Stathis, J.⁸ Brown, S.⁹ Arnold, J.¹⁰ Copel, M.¹¹ Cartier, E.¹² Callegari, A.¹³ Guha, S.¹⁴ Shahidi, G.¹⁵ Chen, T.C.¹⁶

275
- 85015520621
- V. Narayanan, K. Maitra, B.P. Linder, V.K. Paruchuri, E.P. Gusev, M.M. Frank, M.L. Steen, D. LaTulipe, J. Arnold, R. Carruthers, D.L. Lacey, E. Cartier, IEEE ED Lett. 27 (2006) 501.
- (2006) IEEE ED Lett. , vol.27 , pp. 501
- Narayanan, V.¹ Maitra, K.² Linder, B.P.³ Paruchuri, V.K.⁴ Gusev, E.P.⁵ Frank, M.M.⁶ Steen, M.L.⁷ LaTulipe, D.⁸ Arnold, J.⁹ Carruthers, R.¹⁰ Lacey, D.L.¹¹ Cartier, E.¹²

276
- 34548273066
- K. Tse, J. Robertson, Phys. Rev. Lett. 99 (2007) 086805.
- (2007) Phys. Rev. Lett. , vol.99 , pp. 086805
- Tse, K.¹ Robertson, J.²

277
- 77954820517
- K. Tse, D. Liu, J. Robertson, Phys. Rev. B 81 (2010) 035325.
- (2010) Phys. Rev. B , vol.81 , pp. 035325
- Tse, K.¹ Liu, D.² Robertson, J.³

278
- 36149043992
- P.W. Tasker, J. Phys. C 12 (1979) 4977.
- (1979) J. Phys. C , vol.12 , pp. 4977
- Tasker, P.W.¹

279
- 4243749769
- C. Noguera, J. Phys. Condens Mater. 12 (2000) R367.
- (2000) J. Phys. Condens Mater. , vol.12 , pp. R367
- Noguera, C.¹

280
- 11144319376
- K. Shiraishi, K. Yamada, K. Torii, Y. Akasaka, K. Nakajima, M. Konno, T. Chikyow, H. Kitajima, T. Arikado, Jpn. J. Appl. Phys. 43 (2004) L1413.
- (2004) Jpn. J. Appl. Phys. , vol.43 , pp. L1413
- Shiraishi, K.¹ Yamada, K.² Torii, K.³ Akasaka, Y.⁴ Nakajima, K.⁵ Konno, M.⁶ Chikyow, T.⁷ Kitajima, H.⁸ Arikado, T.⁹

281
- 34547917220
- Y. Akasaka, G. Nakamura, K. Shiraishi, N. Umezawa, K. Yamabe, O. Ogawa, K. Nakamura, Jpn. J. Appl. Phys. 45 (2006) L1289.
- (2006) Jpn. J. Appl. Phys. , vol.45 , pp. L1289
- Akasaka, Y.¹ Nakamura, G.² Shiraishi, K.³ Umezawa, N.⁴ Yamabe, K.⁵ Ogawa, O.⁶ Nakamura, K.⁷

282
- 34848861772
- J. Robertson, O. Sharia, A.A. Demkov, Appl. Phys. Lett. 91 (2007) 132912.
- (2007) Appl. Phys. Lett. , vol.91 , pp. 132912
- Robertson, J.¹ Sharia, O.² Demkov, A.A.³

283
- 68249096705
- E. Cartier, M. Hopstaken, M. Copel, Appl. Phys. Lett. 95 (2009) 042901.
- (2009) Appl. Phys. Lett. , vol.95 , pp. 042901
- Cartier, E.¹ Hopstaken, M.² Copel, M.³

284
- 77954819938
- S.C. Song, C.S. Park, J. Price, R. Choi, H.H. Tseng, B.H. Lee, R. Jammy, IEDM (2007) 13.3.
- (2007) IEDM , pp. 13.3
- Song, S.C.¹ Park, C.S.² Price, J.³ Choi, R.⁴ Tseng, H.H.⁵ Lee, B.H.⁶ Jammy, R.⁷

285
- 85059207639
- K. Akiyama, W. Wang, W. Mizubayashi, M. Ikeda, H. Ota, T. Nabatame, A. Toriumi, IEEE Tech Digest VLSI, 2008, p. 8.3.
- (2008) IEEE Tech Digest VLSI , pp. 8.3
- Akiyama, K.¹ Wang, W.² Mizubayashi, W.³ Ikeda, M.⁴ Ota, H.⁵ Nabatame, T.⁶ Toriumi, A.⁷

286
- 35348904424
- J. Schaeffer, D.C. Gilmer, S. Samevadam, M. Raymond, A. Haggag, S. Kalpat, B. Seimie, C. Capasso, B.E. White, J. Appl. Phys. 102 (2007) 074511.
- (2007) J. Appl. Phys. , vol.102 , pp. 074511
- Schaeffer, J.¹ Gilmer, D.C.² Samevadam, S.³ Raymond, M.⁴ Haggag, A.⁵ Kalpat, S.⁶ Seimie, B.⁷ Capasso, C.⁸ White, B.E.⁹

287
- 77956045274
- G. Bersuker, C.S. Park, H.C. Wen, K. Choi, J. Price, P. Lysaght, H.H. Tseng, O. Sharia, A. Demkov, J.T. Ryan, P. Lenahan, IEEE Trans. ED 57 (2010) 2047.
- (2010) IEEE Trans. ED , vol.57 , pp. 2047
- Bersuker, G.¹ Park, C.S.² Wen, H.C.³ Choi, K.⁴ Price, J.⁵ Lysaght, P.⁶ Tseng, H.H.⁷ Sharia, O.⁸ Demkov, A.⁹ Ryan, J.T.¹⁰ Lenahan, P.¹¹

288
- 33847641358
- S. Guha, V.K. Paruchuri, M. Copel, V. Narayanan, Y.Y. Wang, P.E. Batson, N.A. Bojarczuk, B. Linder, B. Doris, Appl. Phys. Lett. 90 (2007) 092902.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 092902
- Guha, S.¹ Paruchuri, V.K.² Copel, M.³ Narayanan, V.⁴ Wang, Y.Y.⁵ Batson, P.E.⁶ Bojarczuk, N.A.⁷ Linder, B.⁸ Doris, B.⁹

289
- 33845419668
- (a) H.N. AlShareef, M. Quevedo-Lopez, H.C. Wen, R. Harris, P. Kirsch, P. Majhi, B.H. Lee, R. Jammy, D.J. Lichtenwalner, J.S. Jur, A.I. Kingon, Appl. Phys. Lett. 89 (2006) 232103;
- (2006) Appl. Phys. Lett. , vol.89 , pp. 232103
- AlShareef, H.N.¹ Quevedo-Lopez, M.² Wen, H.C.³ Harris, R.⁴ Kirsch, P.⁵ Majhi, P.⁶ Lee, B.H.⁷ Jammy, R.⁸ Lichtenwalner, D.J.⁹ Jur, J.S.¹⁰ Kingon, A.I.¹¹

290
- 32944474528
- (b) H.N. AlShareef, K. Choi, H.C. Wen, H. Luan, H. Harris, Y. Senzaki, P. Majhi, B.H. Lee, R. Jammy, Appl. Phys. Lett. 88 (2006) 072108.
- (2006) Appl. Phys. Lett. , vol.88 , pp. 072108
- AlShareef, H.N.¹ Choi, K.² Wen, H.C.³ Luan, H.⁴ Harris, H.⁵ Senzaki, Y.⁶ Majhi, P.⁷ Lee, B.H.⁸ Jammy, R.⁹

291
- 33645154999
- H.N. Alshareef, H.F. Luan, K. Choi, H.R. Harris, H.C. Wen, M.A. Quevedo-Lopez, P. Majhi, B.H. Lee, Appl. Phys. Lett. 88 (2006) 112114.
- (2006) Appl. Phys. Lett. , vol.88 , pp. 112114
- Alshareef, H.N.¹ Luan, H.F.² Choi, K.³ Harris, H.R.⁴ Wen, H.C.⁵ Quevedo-Lopez, M.A.⁶ Majhi, P.⁷ Lee, B.H.⁸

292
- 22944435193
- H.J. Li, M.I. Gardner, IEEE ED Lett. 26 (2005) 441.
- (2005) IEEE ED Lett. , vol.26 , pp. 441
- Li, H.J.¹ Gardner, M.I.²

293
- 33745745755
- X.P. Wang, M.F. Li, A. Chin, C.X. Zhu, J. Shao, W. Lu, X.C. Shen, X.F. Yu, R. Chi, C. Shen, A.C.H. Huan, J.S. Pan, A.Y. Du, P. Lo, D.S.H. Chan, D.L. Kwang, Solid State Electron. 50 (2006) 986.
- (2006) Solid State Electron. , vol.50 , pp. 986
- Wang, X.P.¹ Li, M.F.² Chin, A.³ Zhu, C.X.⁴ Shao, J.⁵ Lu, W.⁶ Shen, X.C.⁷ Yu, X.F.⁸ Chi, R.⁹ Shen, C.¹⁰ Huan, A.C.H.¹¹ Pan, J.S.¹² Du, A.Y.¹³ Lo, P.¹⁴ Chan, D.S.H.¹⁵ Kwang, D.L.¹⁶

294
- 35948958613
- Y. Yamamoto, K. Kita, K. Kyuno, A. Toriumi, Jpn. J. Appl. Phys. 46 (2007) 7251.
- (2007) Jpn. J. Appl. Phys. , vol.46 , pp. 7251
- Yamamoto, Y.¹ Kita, K.² Kyuno, K.³ Toriumi, A.⁴

295
- 41649101225
- K. Iwamoto, Y. Kamimuta, A. Ogawa, Y. Watanabe, S. Migata, T. Nabatame, A. Toriumi, Appl. Phys. Lett. 92 (2008) 132907.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 132907
- Iwamoto, K.¹ Kamimuta, Y.² Ogawa, A.³ Watanabe, Y.⁴ Migata, S.⁵ Nabatame, T.⁶ Toriumi, A.⁷

296
- 40549096055
- P.D. Kirsch, P. Sivasubramani, J. Huang, C.D. Young, M.A. Quevedo-Lopez, H.C. Wen, H. Alshareef, K. Choi, C.S. Park, B.H. Lee, H.H. Tseng, Appl. Phys. Lett. 92 (2008) 092901.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 092901
- Kirsch, P.D.¹ Sivasubramani, P.² Huang, J.³ Young, C.D.⁴ Quevedo-Lopez, M.A.⁵ Wen, H.C.⁶ Alshareef, H.⁷ Choi, K.⁸ Park, C.S.⁹ Lee, B.H.¹⁰ Tseng, H.H.¹¹

297
- 85111790420
- H. Jagannathan, V. Narayanan, S. Brown, Electrochem. Soc. Trans. 16 (2008) 19.
- (2008) Electrochem. Soc. Trans. , vol.16 , pp. 19
- Jagannathan, H.¹ Narayanan, V.² Brown, S.³

298
- 34248655163
- J.K. Schaeffer, et al. Microelectron. Eng. 84 (2007) 2196.
- (2007) Microelectron. Eng. , vol.84 , pp. 2196
- Schaeffer, J.K.¹

299
- 85015509049
- K. Kita, A. Toriumi, Appl. Phys. Lett. 94 (2009) 132903.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 132903
- Kita, K.¹ Toriumi, A.²

300
- 67650486360
- L. Lin, J. Robertson, Appl. Phys. Lett. 95 (2009) 012906.
- (2009) Appl. Phys. Lett. , vol.95 , pp. 012906
- Lin, L.¹ Robertson, J.²

301
- 79959509115
- L. Lin, J. Robertson, J. Appl. Phys. 109 (2011) 094502.
- (2011) J. Appl. Phys. , vol.109 , pp. 094502
- Lin, L.¹ Robertson, J.²

302
- 33846377842
- (a) O. Sharia, A.A. Demkov, G. Bersuker, B.H. Lee, Phys Rev B 75 (2008) 035306;
- (2008) Phys Rev B , vol.75 , pp. 035306
- Sharia, O.¹ Demkov, A.A.² Bersuker, G.³ Lee, B.H.⁴

303
- 40949157023
- (b) O. Sharia, A.A. Demkov, G. Bersuker, B.H. Lee, Phys. Rev. B 77 (2008) 085326.
- (2008) Phys. Rev. B , vol.77 , pp. 085326
- Sharia, O.¹ Demkov, A.A.² Bersuker, G.³ Lee, B.H.⁴

304
- 67349202300
- B.P. Linder, V. Narayanan, V.K. Paruchuri, E. Cartier, S. Kanakasabapathy, Tech Digest SSDM (Tsukuba), 2007, p. 16.
- (2007) Tech Digest SSDM (Tsukuba) , pp. 16
- Linder, B.P.¹ Narayanan, V.² Paruchuri, V.K.³ Cartier, E.⁴ Kanakasabapathy, S.⁵

305
- 0028747841
- S. Takagi, A. Toriumi, M. Iwase, H. Tango, IEEE Trans. ED 41 (1994) 2357.
- (1994) IEEE Trans. ED , vol.41 , pp. 2357
- Takagi, S.¹ Toriumi, A.² Iwase, M.³ Tango, H.⁴

306
- 0035947882
- L.A. Ragnarsson, S. Guha, M. Copel, E. Cartier, N.A. Bojarczuk, J. Karasinski, Appl. Phys. Lett. 78 (2001) 4169.
- (2001) Appl. Phys. Lett. , vol.78 , pp. 4169
- Ragnarsson, L.A.¹ Guha, S.² Copel, M.³ Cartier, E.⁴ Bojarczuk, N.A.⁵ Karasinski, J.⁶

307
- 79956052082
- S. Guha, N.A. Bojarczuk, V. Narayanan, Appl. Phys. Lett. 80 (2002) 766.
- (2002) Appl. Phys. Lett. , vol.80 , pp. 766
- Guha, S.¹ Bojarczuk, N.A.² Narayanan, V.³

308
- 0036655951
- M. Hiratani, S. Saito, Y. Shimamoto, K. Torii, Jpn. J. Appl. Phys. 41 (2002) 4521.
- (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 4521
- Hiratani, M.¹ Saito, S.² Shimamoto, Y.³ Torii, K.⁴

309
- 0037961576
- K. Torii, et al. Microelectron. Eng. 65 (2003) 447.
- (2003) Microelectron. Eng. , vol.65 , pp. 447
- Torii, K.¹

310
- 0035504954
- M.V. Fischetti, D.A. Neumayer, E.A. Cartier, J. Appl. Phys. 90 (2001) 4587.
- (2001) J. Appl. Phys. , vol.90 , pp. 4587
- Fischetti, M.V.¹ Neumayer, D.A.² Cartier, E.A.³

311
- 58149237208
- S. Saito, D. Hisamoto, S. Kimura, M. Hiratani, Tech Digest IEDM, 2003, p. 33.3.
- (2003) Tech Digest IEDM , pp. 33.3
- Saito, S.¹ Hisamoto, D.² Kimura, S.³ Hiratani, M.⁴

312
- 0742321656
- W. Zhu, J.P. Han, T.P. Ma, IEEE Trans. ED 51 (2004) 98.
- (2004) IEEE Trans. ED , vol.51 , pp. 98
- Zhu, W.¹ Han, J.P.² Ma, T.P.³

313
- 0842288289
- L.A. Ragnarsson, L. Pantisano, V. Kaushik, S.I. Saito, Y. Shimamoto, S. DeGendt, M. Heyns, Tech Digest IEDM, 2003, p. 87.
- (2003) Tech Digest IEDM , pp. 87
- Ragnarsson, L.A.¹ Pantisano, L.² Kaushik, V.³ Saito, S.I.⁴ Shimamoto, Y.⁵ DeGendt, S.⁶ Heyns, M.⁷

314
- 85059207453
- Z. Ren, M.V. Fischetti, E.P. Gusev, E.A. Cartier, M. Chudzik, Tech Digest IEDM Paper, 2003, p. 33.2.
- (2003) Tech Digest IEDM Paper , pp. 33.2
- Ren, Z.¹ Fischetti, M.V.² Gusev, E.P.³ Cartier, E.A.⁴ Chudzik, M.⁵

315
- 85015518019
- M. Casse, L. Thevenod, B. Guillaumot, L. Tosti, F. Martin, J. Mitard, O. Weber, F. Andrieu, T. Ernst, G. Reimbold, T. Billon, M. Mouis, F. Boulanger, IEEE Trans. ED (2005).
- (2005) IEEE Trans. ED
- Casse, M.¹ Thevenod, L.² Guillaumot, B.³ Tosti, L.⁴ Martin, F.⁵ Mitard, J.⁶ Weber, O.⁷ Andrieu, F.⁸ Ernst, T.⁹ Reimbold, G.¹⁰ Billon, T.¹¹ Mouis, M.¹² Boulanger, F.¹³

316
- 85015527005
- (a) L.A. Ragnarsson, et al. Microelectron. Eng. (2011);
- (2011) Microelectron. Eng.
- Ragnarsson, L.A.¹

317
- 85015535693
- (b) L.A. Ragnarsson, et al., Tech Digest IEDM, 2010.
- (2010) Tech Digest IEDM
- Ragnarsson, L.A.¹

318
- 67650418339
- A. Kerber, E.A. Cartier, IEEE Trans. Dev. Mater. Reliab. 9 (2009) 147.
- (2009) IEEE Trans. Dev. Mater. Reliab. , vol.9 , pp. 147
- Kerber, A.¹ Cartier, E.A.²

319
- 85015532852
- E.A. Cartier, et al., Tech Digest IEDM, 2011.
- (2011) Tech Digest IEDM
- Cartier, E.A.¹

320
- 0032275853
- (a) J. Stathis, D.J. DiMaria, Tech Digest IEDM, 1998, p. 167;
- (1998) Tech Digest IEDM , pp. 167
- Stathis, J.¹ DiMaria, D.J.²

321
- 0036508455
- (b) J. Stathis, IBM J. Res. Dev. 46 (2002) 265.
- (2002) IBM J. Res. Dev. , vol.46 , pp. 265
- Stathis, J.¹

322
- 67349274910
- B. Kaczer, et al. Microelectron. Eng. 86 (2010) 1894.
- (2010) Microelectron. Eng. , vol.86 , pp. 1894
- Kaczer, B.¹

323
- 85059207348
- J. Franco, et al., Tech Digest IEDM, 2010, p. 4.1.
- (2010) Tech Digest IEDM , pp. 4.1
- Franco, J.¹

324
- 84871821021
- J. Franco, B. Kaczer, P.J. Roussel, J. Mitard, M. Cho, L. Witters, T. Grasser, G. Groeseneken, IEEE Trans. ED 60 (2013) 396.
- (2013) IEEE Trans. ED , vol.60 , pp. 396
- Franco, J.¹ Kaczer, B.² Roussel, P.J.³ Mitard, J.⁴ Cho, M.⁵ Witters, L.⁶ Grasser, T.⁷ Groeseneken, G.⁸

325
- 84878288232
- T. Ando, E.A. Cartier, J. Bruly, K. Choi, V.K. Narayanan, IEEE EDL 34 (2013) 729.
- (2013) IEEE EDL , vol.34 , pp. 729
- Ando, T.¹ Cartier, E.A.² Bruly, J.³ Choi, K.⁴ Narayanan, V.K.⁵

326
- 85015532600
- A. Veloso, et al., Tech Digest VLSI, 2011, p. 34.
- (2011) Tech Digest VLSI , pp. 34
- Veloso, A.¹

327
- 85015515868
- S. Hyun, et al., Tech Digest VLSI, 2011, p. 32.
- (2011) Tech Digest VLSI , pp. 32
- Hyun, S.¹

328
- 85015518943
- (a) B. Greene, et al., Tech Digest IEDM, 2009;
- (2009) Tech Digest IEDM
- Greene, B.¹

329
- 85015533451
- (b) S. Krishnan, et al., Tech Digest IEDM, 2012;
- (2012) Tech Digest IEDM
- Krishnan, S.¹

330
- 85015508908
- (c) S. Narashima, et al., Tech Digest IEDM, 2012;
- (2012) Tech Digest IEDM
- Narashima, S.¹

331
- 84916621601
- IEEE
- (d) K. Choi, et al., Tech Digest VLSI (IEEE), 2009;
- (2009) Tech Digest VLSI
- Choi, K.¹

332
- 85015528445
- (e) S. Natarajan, et al., Tech Digest IEDM, 2008;
- (2008) Tech Digest IEDM
- Natarajan, S.¹

333
- 85015526433
- (f) C. Auth, Tech Digest VLSI, 2012;
- (2012) Tech Digest VLSI
- Auth, C.¹

334
- 85015529416
- (g) F. Amaud, et al., Tech Digest, 2009.
- (2009) Tech Digest
- Amaud, F.¹

335
- 81555220958
- R. Pilarisetty, Nature 479 (2011) 324.
- (2011) Nature , vol.479 , pp. 324
- Pilarisetty, R.¹

336
- 85015531081
- S. Takagi, IEDM Short Course, 2012.
- (2012) IEDM Short Course
- Takagi, S.¹

337
- 85015535050
- P.S. Goley, M.K. Hudait, Materials 7 (2014) 2310.
- (2014) Materials , vol.7 , pp. 2310
- Goley, P.S.¹ Hudait, M.K.²

338
- 37249061772
- Y. Kamata, Mater. Today 11 (1-2) (2008) 30.
- (2008) Mater. Today , vol.11 , Issue.1-2 , pp. 30
- Kamata, Y.¹

339
- 84885640198
- C. Claeys, J. Mitard, G. Hellings, C. Eneman, B. DeJaeger, L. Witters, R. Loo, A. Delablie, A. Sioncke, M. Caymax, ECS Trans. 54 (2013) 25.
- (2013) ECS Trans. , vol.54 , pp. 25
- Claeys, C.¹ Mitard, J.² Hellings, G.³ Eneman, C.⁴ DeJaeger, B.⁵ Witters, L.⁶ Loo, R.⁷ Delablie, A.⁸ Sioncke, A.⁹ Caymax, M.¹⁰

340
- 84870055992
- E. Simeon, J. Mitard, G. Hellings, Mater. Sci. Semicond. Proc. 15 (2012) 588.
- (2012) Mater. Sci. Semicond. Proc. , vol.15 , pp. 588
- Simeon, E.¹ Mitard, J.² Hellings, G.³

341
- 84862751339
- Q. Xie, S. Deng, M. Schaekers, D. Lin, M. Caymax, A. Delablie, X.P. Qu, Y.L. Jiang, D. Deduytsche, C. Detavernier, Semicond. Sci. Technol. 27 (2012) 074012.
- (2012) Semicond. Sci. Technol. , vol.27 , pp. 074012
- Xie, Q.¹ Deng, S.² Schaekers, M.³ Lin, D.⁴ Caymax, M.⁵ Delablie, A.⁶ Qu, X.P.⁷ Jiang, Y.L.⁸ Deduytsche, D.⁹ Detavernier, C.¹⁰

342
- 0036923998
- C.O. Chui, et al., Tech Digest IEDM, 2002, p. 437.
- (2002) Tech Digest IEDM , pp. 437
- Chui, C.O.¹

343
- 12144285893
- H.L. Shang, K.L. Lee, P. Kowlowski, C. D'Emic, B.E. Sikorski, M. Ieong, H.S.P. Wong, K. Guarini, W.E. Haensch, IEEE ED Lett. 25 (2004) 135.
- (2004) IEEE ED Lett. , vol.25 , pp. 135
- Shang, H.L.¹ Lee, K.L.² Kowlowski, P.³ D'Emic, C.⁴ Sikorski, B.E.⁵ Ieong, M.⁶ Wong, H.S.P.⁷ Guarini, K.⁸ Haensch, W.E.⁹

344
- 17044437005
- A. Dimoulas, et al. Appl. Phys. Lett. 86 (2005) 032908.
- (2005) Appl. Phys. Lett. , vol.86 , pp. 032908
- Dimoulas, A.¹

345
- 48249137791
- K. Kita, S. Suzuki, H. Nomura, T. Takahashi, T. Nishimura, A. Toriumi, Jpn. J. Appl. Phys. 47 (2008) 2349.
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 2349
- Kita, K.¹ Suzuki, S.² Nomura, H.³ Takahashi, T.⁴ Nishimura, T.⁵ Toriumi, A.⁶

346
- 67349222362
- A. Toriumi, T. Tabata, C.H. Lee, T. Nishimura, K. Kita, K. Nagashio, Microelectron. Eng. 86 (2009) 1571.
- (2009) Microelectron. Eng. , vol.86 , pp. 1571
- Toriumi, A.¹ Tabata, T.² Lee, C.H.³ Nishimura, T.⁴ Kita, K.⁵ Nagashio, K.⁶

347
- 68249110411
- C.H. Lee, T. Tabata, T. Nishimura, K. Nagashio, K. Kita, A. Toriumi, Appl. Phys. Express 2 (2009) 071404.
- (2009) Appl. Phys. Express , vol.2 , pp. 071404
- Lee, C.H.¹ Tabata, T.² Nishimura, T.³ Nagashio, K.⁴ Kita, K.⁵ Toriumi, A.⁶

348
- 77957886447
- D. Kuzum, T. Krishnamohan, A. Nainani, Y. Sun, P.A.H. Pianetta, S.-P. Wong, K.C. Saraswat, IEEE IEDM Tech. Digest, 2009, p. 453.
- (2009) IEEE IEDM Tech. Digest , pp. 453
- Kuzum, D.¹ Krishnamohan, T.² Nainani, A.³ Sun, Y.⁴ Pianetta, P.A.H.⁵ Wong, S.-P.⁶ Saraswat, K.C.⁷

349
- 70350100491
- T. Sasada, Y. Nakakita, M. Takenaka, S. Takagi, J. Appl. Phys. 106 (2009) 073716.
- (2009) J. Appl. Phys. , vol.106 , pp. 073716
- Sasada, T.¹ Nakakita, Y.² Takenaka, M.³ Takagi, S.⁴

350
- 34548230096
- A. Delabie, et al. Appl. Phys. Lett. 91 (2007) 082904.
- (2007) Appl. Phys. Lett. , vol.91 , pp. 082904
- Delabie, A.¹

351
- 85059207692
- K. Kita, S.K. Wang, M. Yoshida, C.H. Lee, K. Nagashio, T. Nishimura, A. Toriumi, IEDM Tech. Digest, 2009, p. 29.6.
- (2009) IEDM Tech. Digest , pp. 29.6
- Kita, K.¹ Wang, S.K.² Yoshida, M.³ Lee, C.H.⁴ Nagashio, K.⁵ Nishimura, T.⁶ Toriumi, A.⁷

352
- 79955427240
- S. Wang, K. Kita, T. Nishimura, K. Nagashio, A. Toriumi, Jpn. J. Appl. Phys. 50 (2011) 04DA01.
- (2011) Jpn. J. Appl. Phys. , vol.50 , pp. 04DA01
- Wang, S.¹ Kita, K.² Nishimura, T.³ Nagashio, K.⁴ Toriumi, A.⁵

353
- 79955539932
- C.H. Lee, T. Nishimura, K. Nagashio, K. Kita, A. Toriumi, IEEE Trans. ED 58 (2011) 1295, p. 209.
- (2011) IEEE Trans. ED , vol.58
- Lee, C.H.¹ Nishimura, T.² Nagashio, K.³ Kita, K.⁴ Toriumi, A.⁵

354
- 85059207559
- C.H. Lee, C. Lu, T. Tabata, W.F. Zhang, T. Nishimura, K. Nagashio, A. Toriumi, Tech. Digest IEDM, 2013, p. 2.5.
- (2013) Tech. Digest IEDM , pp. 2.5
- Lee, C.H.¹ Lu, C.² Tabata, T.³ Zhang, W.F.⁴ Nishimura, T.⁵ Nagashio, K.⁶ Toriumi, A.⁷

355
- 2142758723
- V.V. Afanasev, A. Stesmans, Appl. Phys. Lett. 84 (2004) 2319.
- (2004) Appl. Phys. Lett. , vol.84 , pp. 2319
- Afanasev, V.V.¹ Stesmans, A.²

356
- 38349085909
- V. Afanasev, A. Stsmans, A. Delabie, F. Bellenger, M. Houssa, M. Meuris, Appl. Phys. Lett. 92 (2008) 022109.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 022109
- Afanasev, V.¹ Stsmans, A.² Delabie, A.³ Bellenger, F.⁴ Houssa, M.⁵ Meuris, M.⁶

357
- 32644442450
- A. Ohta, S. Miyazaki, et al. J. Surf. Sci. Nanotechnol. 4 (2006) 174.
- (2006) J. Surf. Sci. Nanotechnol. , vol.4 , pp. 174
- Ohta, A.¹ Miyazaki, S.²

358
- 64349092645
- P. Boqvist, F. Binder, A. Pasquarello, Appl. Phys. Lett. 94 (2009) 141911.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 141911
- Boqvist, P.¹ Binder, F.² Pasquarello, A.³

359
- 78650385738
- H. Li, K. Xiong, J. Robertson, Appl. Phys. Lett. 97 (2010) 242902.
- (2010) Appl. Phys. Lett. , vol.97 , pp. 242902
- Li, H.¹ Xiong, K.² Robertson, J.³

360
- 33845962528
- A. Dimoulas, Appl. Phys. Lett. 89 (2006) 252110.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 252110
- Dimoulas, A.¹

361
- 34948842586
- J.R. Weber, A. Janotti, P. Rinke, C.G. van de Walle, Appl. Phys. Lett. 91 (2007) 142101.
- (2007) Appl. Phys. Lett. , vol.91 , pp. 142101
- Weber, J.R.¹ Janotti, A.² Rinke, P.³ Van De Walle, C.G.⁴

362
- 0021519639
- E.H. Poindexter, G.J. Gerardi, M.E. Rueckel, P.J. Caplan, N.M. Johnson, D.K. Biegelsen, J. Appl. Phys. 56 (1984) 2844.
- (1984) J. Appl. Phys. , vol.56 , pp. 2844
- Poindexter, E.H.¹ Gerardi, G.J.² Rueckel, M.E.³ Caplan, P.J.⁴ Johnson, N.M.⁵ Biegelsen, D.K.⁶

363
- 50049088844
- P. Broqvist, A. Alkauskas, A. Pasquarello, Phys. Rev. B 78 (2008) 075203.
- (2008) Phys. Rev. B , vol.78 , pp. 075203
- Broqvist, P.¹ Alkauskas, A.² Pasquarello, A.³

364
- 34648814123
- T. Nishimura, K. Kita, A. Toriumi, Appl. Phys. Lett. 91 (2007) 123123.
- (2007) Appl. Phys. Lett. , vol.91 , pp. 123123
- Nishimura, T.¹ Kita, K.² Toriumi, A.³

365
- 84898725371
- H. Seo, et al. Phys. Rev. B 89 (2014) 115318.
- (2014) Phys. Rev. B , vol.89 , pp. 115318
- Seo, H.¹

366
- 36749115753
- K.L. Brower, Appl. Phys. Lett. 43 (1983) 1111.
- (1983) Appl. Phys. Lett. , vol.43 , pp. 1111
- Brower, K.L.¹

367
- 54949120181
- M. Houssa, G. Pourtois, M. Caymax, M. Meuris, M.M. Heyns, V. Afanasev, A. Stesmans, Appl. Phys. Lett. 93 (2008) 161909.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 161909
- Houssa, M.¹ Pourtois, G.² Caymax, M.³ Meuris, M.⁴ Heyns, M.M.⁵ Afanasev, V.⁶ Stesmans, A.⁷

368
- 65649137016
- A. Stesmans, P. Somers, V.V. Afanasev, Phys. Rev. B 79 (2009) 195301.
- (2009) Phys. Rev. B , vol.79 , pp. 195301
- Stesmans, A.¹ Somers, P.² Afanasev, V.V.³

369
- 84867525295
- P. Somers, A. Stesmans, L. Souriau, V.V. Afanasev, J. Appl. Phys. 112 (2012) 074501.
- (2012) J. Appl. Phys. , vol.112 , pp. 074501
- Somers, P.¹ Stesmans, A.² Souriau, L.³ Afanasev, V.V.⁴

370
- 57849127979
- S. Baldovino, M. Fanciuli, Appl. Phys. Lett. 93 (2008) 242105.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 242105
- Baldovino, S.¹ Fanciuli, M.²

371
- 77953582605
- S. Baldovino, A. Molle, M. Fanciulli, Appl. Phys. Lett. 96 (2010) 222110.
- (2010) Appl. Phys. Lett. , vol.96 , pp. 222110
- Baldovino, S.¹ Molle, A.² Fanciulli, M.³

372
- 84877912644
- S. Paleari, A. Baldovino, A. Molle, M. Fanciulli, Phys. Rev. Lett. 110 (2013) 206101.
- (2013) Phys. Rev. Lett. , vol.110 , pp. 206101
- Paleari, S.¹ Baldovino, A.² Molle, A.³ Fanciulli, M.⁴

373
- 84905860867
- A. Stesmans, T.N. Hoang, V.V. Afanasev, J. Appl. Phys. 116 (2014) 044501.
- (2014) J. Appl. Phys. , vol.116 , pp. 044501
- Stesmans, A.¹ Hoang, T.N.² Afanasev, V.V.³

374
- 84862024265
- P. Broqvist, J.F. Binder, A. Pasquarello, Phys. B 407 (2012) 2926.
- (2012) Phys. B , vol.407 , pp. 2926
- Broqvist, P.¹ Binder, J.F.² Pasquarello, A.³

375
- 84876745813
- (a) H. Li, J. Robertson, Microelecron. Eng. 109 (2013) 244;
- (2013) Microelecron. Eng. , vol.109 , pp. 244
- Li, H.¹ Robertson, J.²

376
- 84916621597
- Given at IEEE, San Diego
- (b) H. Li, J. Robertson, Given at Semiconductor Interface Specialists meeting (IEEE), San Diego, 2013.
- (2013) Semiconductor Interface Specialists Meeting
- Li, H.¹ Robertson, J.²

377
- 69249185908
- R.M. Wallace, P.C. McIntyre, J. Kim, Y. Nishi, MRS Bull. 34 (2009) 493.
- (2009) MRS Bull. , vol.34 , pp. 493
- Wallace, R.M.¹ McIntyre, P.C.² Kim, J.³ Nishi, Y.⁴

378
- 0142057279
- H. Kim, C.O. Chui, K.C. Saraswat, P.C. McIntyre, Appl. Phys. Lett. 83 (2003) 2647.
- (2003) Appl. Phys. Lett. , vol.83 , pp. 2647
- Kim, H.¹ Chui, C.O.² Saraswat, K.C.³ McIntyre, P.C.⁴

379
- 34248639328
- S. Takagi, T. Maeda, N. Taoka, M. Nishizawa, Y. Morita, K. Ikeda, Y. Yamashita, M. Nishikawa, H. Kumagai, R. Nakane, S. Sugahara, N. Sugiyama, Microelectron. Eng. 84 (2007) 2314.
- (2007) Microelectron. Eng. , vol.84 , pp. 2314
- Takagi, S.¹ Maeda, T.² Taoka, N.³ Nishizawa, M.⁴ Morita, Y.⁵ Ikeda, K.⁶ Yamashita, Y.⁷ Nishikawa, M.⁸ Kumagai, H.⁹ Nakane, R.¹⁰ Sugahara, S.¹¹ Sugiyama, N.¹²

380
- 45049085545
- M. Caymax, M. Houssa, G. Pourtois, F. Bellenger, K. Martens, A. Delabie, S. Van Elshocht, Appl. Surf. Sci. 254 (2008) 6094.
- (2008) Appl. Surf. Sci. , vol.254 , pp. 6094
- Caymax, M.¹ Houssa, M.² Pourtois, G.³ Bellenger, F.⁴ Martens, K.⁵ Delabie, A.⁶ Van Elshocht, S.⁷

381
- 71549142268
- M. Milojevic, R. Contreras-Guerrero, M. Lopez-Lopez, J. Kim, R.M. Wallace, Appl. Phys. Lett. 95 (2009) 212902.
- (2009) Appl. Phys. Lett. , vol.95 , pp. 212902
- Milojevic, M.¹ Contreras-Guerrero, R.² Lopez-Lopez, M.³ Kim, J.⁴ Wallace, R.M.⁵

382
- 84862878016
- R. Zhang, N. Taoka, P.-C. Huang, M. Takenaka, S. Takagi, IEEE IEDM Tech. Digest, 2011, p. 642.
- (2011) IEEE IEDM Tech. Digest , pp. 642
- Zhang, R.¹ Taoka, N.² Huang, P.-C.³ Takenaka, M.⁴ Takagi, S.⁵

383
- 79958059543
- R. Zhang, T. Iwasaki, N. Taoka, M. Takenaka, S. Takagi, Microelectron. Eng. 88 (2011) 1533.
- (2011) Microelectron. Eng. , vol.88 , pp. 1533
- Zhang, R.¹ Iwasaki, T.² Taoka, N.³ Takenaka, M.⁴ Takagi, S.⁵

384
- 85015516454
- R. Zhang, T. Iwasaki, N. Taoka, M. Takenaka, S. Takagi, Tech. Digest VLSI Symp., 2011, p. 56.
- Tech. Digest VLSI Symp., 2011 , pp. 56
- Zhang, R.¹ Iwasaki, T.² Taoka, N.³ Takenaka, M.⁴ Takagi, S.⁵

385
- 80051743257
- R. Zhang, T. Iwasaki, N. Taoka, M. Takenaka, S. Takagi, J. Electrochem. Soc. G178 (2011).
- (2011) J. Electrochem. Soc. , vol.G178
- Zhang, R.¹ Iwasaki, T.² Taoka, N.³ Takenaka, M.⁴ Takagi, S.⁵

386
- 79953094068
- D. Kuzum, J.-H. Park, T.H. Krishnamohan, S.-P. Wong, K.C. Saraswat, IEEE Trans. Electron. Dev. 58 (2011) 1015.
- (2011) IEEE Trans. Electron. Dev. , vol.58 , pp. 1015
- Kuzum, D.¹ Park, J.-H.² Krishnamohan, T.H.³ Wong, S.-P.⁴ Saraswat, K.C.⁵

387
- 8344249538
- H. Kim, P.C. McIntyre, C.O. Chui, K.C. Saraswat, M.H. Cho, Appl. Phys. Lett. 85 (2004) 2902.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 2902
- Kim, H.¹ McIntyre, P.C.² Chui, C.O.³ Saraswat, K.C.⁴ Cho, M.H.⁵

388
- 33745728942
- C.O. Chui, F. Ito, K.C. Saraswat, IEEE Trans. Electron. Dev. 53 (2006) 1501.
- (2006) IEEE Trans. Electron. Dev. , vol.53 , pp. 1501
- Chui, C.O.¹ Ito, F.² Saraswat, K.C.³

389
- 33745686693
- C.O. Chui, H. Kim, D. Chi, P.C. McIntyre, K.C. Saraswat, IEEE Trans. Electron. Dev. 53 (2006) 1509.
- (2006) IEEE Trans. Electron. Dev. , vol.53 , pp. 1509
- Chui, C.O.¹ Kim, H.² Chi, D.³ McIntyre, P.C.⁴ Saraswat, K.C.⁵

390
- 65549142644
- Y. Oshima, M. Shandalov, Y. Sun, P. Pianetta, P.C. McIntyre, Appl. Phys. Lett. 92 (2009) 183102.
- (2009) Appl. Phys. Lett. , vol.92 , pp. 183102
- Oshima, Y.¹ Shandalov, M.² Sun, Y.³ Pianetta, P.⁴ McIntyre, P.C.⁵

391
- 78650650758
- Q. Xie, J. Musschoot, M. Schaekers, M. Caymax, A. Delabie, X.P. Qu, Y.L. Jiang, S.V. Berghe, J. Liu, C. Detavernier, Appl. Phys. Lett. 97 (2010) 222902.
- (2010) Appl. Phys. Lett. , vol.97 , pp. 222902
- Xie, Q.¹ Musschoot, J.² Schaekers, M.³ Caymax, M.⁴ Delabie, A.⁵ Qu, X.P.⁶ Jiang, Y.L.⁷ Berghe, S.V.⁸ Liu, J.⁹ Detavernier, C.¹⁰

392
- 80655141505
- S. Sioncke, H.C. Lin, L. Nyns, G. Brammertz, A. Delabie, T. Conard, A. Franquet, J. Rip, S. DeGendt, M. Mulle, B. Beckhoff, M. Caymax, J. Appl. Phys. 110 (2011) 084907.
- (2011) J. Appl. Phys. , vol.110 , pp. 084907
- Sioncke, S.¹ Lin, H.C.² Nyns, L.³ Brammertz, G.⁴ Delabie, A.⁵ Conard, T.⁶ Franquet, A.⁷ Rip, J.⁸ DeGendt, S.⁹ Mulle, M.¹⁰ Beckhoff, B.¹¹ Caymax, M.¹²

393
- 80052332142
- A. Delabie, S. Sioncke, J. Rip, S. Van Elshocht, M. Caymax, G. Pourtois, K. Pierloot, J. Phys. Chem. C 115 (2011) 17523.
- (2011) J. Phys. Chem. C , vol.115 , pp. 17523
- Delabie, A.¹ Sioncke, S.² Rip, J.³ Van Elshocht, S.⁴ Caymax, M.⁵ Pourtois, G.⁶ Pierloot, K.⁷

394
- 84880203164
- C. Fleischmann, K. Schouteden, M. Muller, P. Honicke, B. Beckhoff, S. Sioncke, H.G. Boyen, M. Meuris, C.V. Hasendoek, K. Temst, A. Vantomme, J. Mater. Chem. C 1 (2013) 4105.
- (2013) J. Mater. Chem. C , vol.1 , pp. 4105
- Fleischmann, C.¹ Schouteden, K.² Muller, M.³ Honicke, P.⁴ Beckhoff, B.⁵ Sioncke, S.⁶ Boyen, H.G.⁷ Meuris, M.⁸ Hasendoek, C.V.⁹ Temst, K.¹⁰ Vantomme, A.¹¹

395
- 80051685547
- J.S. Lee, T. Kaufman-Osborn, W. Melitz, S. Lee, A. Delabie, S. Sioncke, M. Caymax, G. Pourtois, A.C. Kummel, J. Chem. Phys. 135 (2011) 054705.
- (2011) J. Chem. Phys. , vol.135 , pp. 054705
- Lee, J.S.¹ Kaufman-Osborn, T.² Melitz, W.³ Lee, S.⁴ Delabie, A.⁵ Sioncke, S.⁶ Caymax, M.⁷ Pourtois, G.⁸ Kummel, A.C.⁹

396
- 84864691281
- H. Li, J. Robertson, Appl. Phys. Lett. 101 (2013) 052903.
- (2013) Appl. Phys. Lett. , vol.101 , pp. 052903
- Li, H.¹ Robertson, J.²

397
- 85059207553
- R. Zhang, P.C. Huang, J.C. Lin, M. Takenaka, S. Takagi, Tech. Digest IEDM, 2012, p. 16.1.
- (2012) Tech. Digest IEDM , pp. 16.1
- Zhang, R.¹ Huang, P.C.² Lin, J.C.³ Takenaka, M.⁴ Takagi, S.⁵

398
- 85059207602
- R. Zhang, J.C. Lin, X. Yu, M. Takenaka, S. Takagi, Tech. Digest VLSI, 2013, p. 3.1.
- (2013) Tech. Digest VLSI , pp. 3.1
- Zhang, R.¹ Lin, J.C.² Yu, X.³ Takenaka, M.⁴ Takagi, S.⁵

399
- 84874880196
- R. Zhang, P.C. Huang, J.C. Lin, M. Takenaka, S. Takagi, Appl. Phys. Lett. 102 (2013) 081603.
- (2013) Appl. Phys. Lett. , vol.102 , pp. 081603
- Zhang, R.¹ Huang, P.C.² Lin, J.C.³ Takenaka, M.⁴ Takagi, S.⁵

400
- 85059207129
- C.H. Lee, C. Lu, T. Tabata, K. Nagashio, A. Toriumi, Tech. Digest VLSI, 2013, p. 3.2.
- (2013) Tech. Digest VLSI , pp. 3.2
- Lee, C.H.¹ Lu, C.² Tabata, T.³ Nagashio, K.⁴ Toriumi, A.⁵

401
- 67651240703
- S. Swaminathan, Y. Oshima, M.A. Kelly, P.C. McIntyre, Appl. Phys. Lett. 95 (2009) 032907.
- (2009) Appl. Phys. Lett. , vol.95 , pp. 032907
- Swaminathan, S.¹ Oshima, Y.² Kelly, M.A.³ McIntyre, P.C.⁴

402
- 84880900004
- J. Han, R. Zhang, T. Osada, M. Hata, M. Takenada, S. Takagi, Appl. Phys. Express 6 (2013) 051302.
- (2013) Appl. Phys. Express , vol.6 , pp. 051302
- Han, J.¹ Zhang, R.² Osada, T.³ Hata, M.⁴ Takenada, M.⁵ Takagi, S.⁶

403
- 85015521094
- A. Toriumi, et al., Tech. Digest IEDM, 2009.
- (2009) Tech. Digest IEDM
- Toriumi, A.¹

404
- 85015530603
- R. Zhang, et al., Tech. Digest IEDM, 2012.
- (2012) Tech. Digest IEDM
- Zhang, R.¹

405
- 85015535175
- R. Zhang, et al., Tech. Digest IEDM, 2013.
- (2013) Tech. Digest IEDM
- Zhang, R.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.