Structure of ultrathin SiO2/Si(111) interfaces studied by photoelectron spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1250-1257

  Keister, J W ^a,d   Rowe, J E ^a,b,d   Kolodziej, J J ^b   Niimi, H ^c   Tao, H S ^b   Madey, T E ^b   Lucovsky, G ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b RUTGERS UNIVERSITY   (United States)

^c North Carolina State University   (United States)

^d U S ARMY RESEARCH OFFICE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3843115732     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581805     Document Type: Article

References (23)

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