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Volumn 27, Issue 3, 2002, Pages 206-211

Materials characterization of alternative gate dielectrics

(7) Busch, Brett W a Pluchery, Olivier a Chabal, Yves J a Muller, David A a Opila, Robert L a Kwo, J Raynien a Garfunkel, Eric a

a NONE

Author keywords

Chemical structure; Electron energy loss spectroscopy (EELS); High dielectric constant materials; High dielectrics; Infrared absorption spectroscopy (IRAS); Medium energy ion scattering (MEIS); Physical characterization; Scanning transmission electron microscopy (STEM); Thin films; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ABSORPTION SPECTROSCOPY; DIELECTRIC PROPERTIES; ELECTRON ENERGY LOSS SPECTROSCOPY; GATES (TRANSISTOR); INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); SCANNING ELECTRON MICROSCOPY; SILICA; SILICON; STRUCTURE (COMPOSITION); TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ALTERNATIVE GATE DIELECTRICS; INFRARED ABSORPTION SPECTROSCOPY; MATERIALS CHARACTERIZATION; MEDIUM ENERGY ION SCATTERING; SCANNING TRANSMISSION ELECTRON MICROSCOPY;

DIELECTRIC FILMS;

EID: 0036501102 PISSN: 08837694 EISSN: None Source Type: Journal
DOI: 10.1557/mrs2002.72 Document Type: Article

Times cited : (75)

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