The high-k solution

IEEE Spectrum

Volumn 44, Issue 10, 2007, Pages 29-35

  Bohr, MarkT ^a   Chau, Robert S ^a   Ghani, Tahir ^a   Mistry, Kaizad ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CHARGE; ELECTRIC CURRENTS; ELECTRIC FIELDS; GATES (TRANSISTOR); MICROPROCESSOR CHIPS;

GATE INSULATOR; METAL GATE TRANSISTORS;

ELECTRIC INSULATORS;

EID: 35348909664     PISSN: 00189235     EISSN: None     Source Type: Journal    
DOI: 10.1109/MSPEC.2007.4337663     Document Type: Article

References (2)

1. R. S. Chau High-k/Metal-Gate Stack and Its MOSFET Characteristics IEEE Electron Device Letters June 2004