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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 7 A, 2002, Pages 4521-4522

Effective electron mobility reduced by remote charge scattering in high-κ gate stacks

(4) Hiratani, Masahiko a Saito, Shin Ich a Shimamoto, Yasuhiro a Torii, Kazuyoshi a

a HITACHI LTD (Japan)

Author keywords

Dielectric; Gate; High ; Mobility; Remote charge scattering

Indexed keywords

ELECTRON SCATTERING; GATES (TRANSISTOR); INTERFACES (MATERIALS); MOSFET DEVICES; PERMITTIVITY; SILICA; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

COULOMB POTENTIAL; REMOTE CHARGE SCATTERING;

ELECTRON MOBILITY;

EID: 0036655951 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.4521 Document Type: Article

Times cited : (60)

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