Characterization of the "clean-up" of the oxidized Ge(100) surface by atomic layer deposition

Applied Physics Letters

Volumn 95, Issue 21, 2009, Pages

  Milojevic, M ^a   Contreras Guerrero, R ^b   Lopez Lopez, M ^b   Kim, J ^a   Wallace, R M ^a  

^a The University of Texas at Dallas   (United States)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

GE SUBSTRATES; GE(100) SURFACE; GERMANIUM OXIDES; GERMANIUM SURFACE; IN-SITU; INTERFACIAL REACTIONS; MONOCHROMATIC X-RAYS; NATIVE OXIDES;

ATOMIC LAYER DEPOSITION; GERMANIUM; OXIDES; THERMOANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 71549142268     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3268449     Document Type: Article

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